scholarly journals Inorganic–organic superlattice thin films for thermoelectrics

2015 ◽  
Vol 3 (40) ◽  
pp. 10349-10361 ◽  
Author(s):  
J.-P. Niemelä ◽  
A. J. Karttunen ◽  
M. Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Thermal Conductivity ◽  
Thermoelectric Materials ◽  
Electrical Transport ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Electrical Transport Properties ◽  
Molecular Layer Deposition ◽  
Layer Deposition

Nanoscale layer-engineering using the combined atomic/molecular layer deposition (ALD/MLD) technique for the fabrication of oxide–organic thin-film superlattices is an attractive way to tailor the performance of thermoelectric materials as it potentially allows us to suppress thermal conductivity without significantly hindering the electrical transport properties.

scholarly journals Composition-tuned metal–organic thin-film structures based on photoswitchable azobenzene by ALD/MLD

2020 ◽  
Vol 49 (32) ◽  
pp. 11310-11316
Author(s):  
Aida Khayyami ◽  
Anish Philip ◽  
Jenna Multia ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Metal Organic

We demonstrate the fabrication of in-situ crystalline thin films of various azobenzene (AZO) based photoresponsive metal–organic structures using the atomic/molecular layer deposition (ALD/MLD) technique.

scholarly journals Atomic/molecular layer deposition of Ni-terephthalate thin films

2021 ◽  
Author(s):  
Anish Philip ◽  
Sami Vasala ◽  
Pieter Glatzel ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Organic Components ◽  
Layer Deposition ◽  
Metal Organic

Atomic/molecular layer deposition (ALD/MLD) is currently strongly emerging as an intriguing route for novel metal-organic thin-film materials. This approach already covers a variety of metal and organic components, and potential...

scholarly journals ALD/MLD fabrication of luminescent Eu-organic hybrid thin films using different aromatic carboxylic acid components with N and O donors

RSC Advances ◽  
2016 ◽  
Vol 6 (105) ◽  
pp. 103412-103417 ◽  
Author(s):  
Z. Giedraityte ◽  
L.-S. Johansson ◽  
M. Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Carboxylic Acid ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Aromatic Carboxylic Acid ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Hybrid Thin Films

Atomic/molecular layer deposition (ALD/MLD) processes based on Eu(thd)3 and three different aromatic organic acids with O and N donors as precursors are systematically investigated for the growth of Eu-based inorganic–organic thin-film phosphors.

Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane

2020 ◽  
Vol 56 (62) ◽  
pp. 8778-8781
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgenii Modin ◽  
Mladen Petravić ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Ring Opening ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Ring Opening Reactions

Two consecutive vapor-to-solid ring opening reactions were applied for thin film siloxane polymerization by molecular layer deposition (MLD).

scholarly journals Organic and inorganic–organic thin film structures by molecular layer deposition: A review

2014 ◽  
Vol 5 ◽  
pp. 1104-1136 ◽  
Author(s):  
Pia Sundberg ◽  
Maarit Karppinen
Keyword(s):  
Thin Films ◽  
Hybrid Materials ◽  
Molecular Layer ◽  
Three Dimensional ◽  
Atomic Layer ◽  
Great Promise ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Composition Control ◽  
Layer Deposition

The possibility to deposit purely organic and hybrid inorganic–organic materials in a way parallel to the state-of-the-art gas-phase deposition method of inorganic thin films, i.e., atomic layer deposition (ALD), is currently experiencing a strongly growing interest. Like ALD in case of the inorganics, the emerging molecular layer deposition (MLD) technique for organic constituents can be employed to fabricate high-quality thin films and coatings with thickness and composition control on the molecular scale, even on complex three-dimensional structures. Moreover, by combining the two techniques, ALD and MLD, fundamentally new types of inorganic–organic hybrid materials can be produced. In this review article, we first describe the basic concepts regarding the MLD and ALD/MLD processes, followed by a comprehensive review of the various precursors and precursor pairs so far employed in these processes. Finally, we discuss the first proof-of-concept experiments in which the newly developed MLD and ALD/MLD processes are exploited to fabricate novel multilayer and nanostructure architectures by combining different inorganic, organic and hybrid material layers into on-demand designed mixtures, superlattices and nanolaminates, and employing new innovative nanotemplates or post-deposition treatments to, e.g., selectively decompose parts of the structure. Such layer-engineered and/or nanostructured hybrid materials with exciting combinations of functional properties hold great promise for high-end technological applications.

scholarly journals Li-Containing Organic Thin Film—Structure of Lithium Propane Dioxide via Molecular Layer Deposition

2020 ◽  
Vol 124 (12) ◽  
pp. 6830-6837 ◽  
Author(s):  
Haotian Wang ◽  
Keith E. Gregorczyk ◽  
Sang Bok Lee ◽  
Gary W. Rubloff ◽  
Chuan-Fu Lin
Keyword(s):  
Thin Film ◽  
Molecular Layer ◽  
Film Structure ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Thin Film Structure ◽  
Layer Deposition

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Molecular Layer ◽  
Thin Film Growth ◽  
Cross Linking ◽  
Layer By Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Hybrid Thin Films ◽  
Enhanced Stability

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.

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