Low temperature vacuum ultraviolet annealing of ZrO2 optical coatings grown by laser ablation

1998 ◽  
Vol 34 (15) ◽  
pp. 1527 ◽  
Author(s):  
V. Craciun ◽  
D. Craciun ◽  
I.W. Boyd
Keyword(s):  
Laser Ablation ◽  
Low Temperature ◽  
Vacuum Ultraviolet ◽  
Optical Coatings

Low temperature shallow junction formation using vacuum ultraviolet photons during rapid thermal processing

1997 ◽  
Vol 70 (13) ◽  
pp. 1700-1702 ◽  
Author(s):  
R. Singh ◽  
K. C. Cherukuri ◽  
L. Vedula ◽  
A. Rohatgi ◽  
S. Narayanan
Keyword(s):  
Low Temperature ◽  
Thermal Processing ◽  
Vacuum Ultraviolet ◽  
Rapid Thermal Processing ◽  
Shallow Junction ◽  
Junction Formation ◽  
Ultraviolet Photons

A low-temperature limit for growth of ZnO nanowires by using of laser ablation processes

2020 ◽  
Vol 126 (4) ◽  
Author(s):  
Jaroslav Bruncko ◽  
Miroslav Michalka ◽  
Jaroslav Kovac ◽  
Andrej Vincze
Keyword(s):  
Laser Ablation ◽  
Low Temperature ◽  
Temperature Limit ◽  
Zno Nanowires

scholarly journals Deposition of fluoropolymer thin films by vacuum-ultraviolet laser ablation.

1994 ◽  
Vol 7 (2) ◽  
pp. 373-380 ◽  
Author(s):  
SHINGO INOUE ◽  
TAKEO FUJII ◽  
YOSHIAKI UENO ◽  
FUMIHITKO KANNARI
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Laser ◽  
Vacuum Ultraviolet Laser

Vacuum Ultraviolet Laser Ablation of Teflon (PTFE)

1992 ◽  
Vol 285 ◽  
Author(s):  
Peter R. Herman ◽  
Boyi Chen ◽  
David J. Moore
Keyword(s):  
Experimental Data ◽  
Laser Ablation ◽  
Computer Model ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Laser ◽  
Swelling Characteristics ◽  
Vacuum Ultraviolet Laser ◽  
193 Nm ◽  
Fluence Range

ABSTRACTVacuum-ultraviolet laser ablation of Teflon is reviewed. The 157 nm irradiation of Teflon produces clean ablation sites well suited to micromachining applications in the electronics and medical fields. At 193 nm, etching profiles are poorly defined, showing swelling characteristics commonly produced by longer wavelength lasers. Comprehensive new 193 nm ablation data are presented showing the first evidence of incubation effects for Teflon. A computer model was developed to include ablation, swelling and incubation processes. The computer results satisfactorily model the experimental data over a large fluence range of 0.6 to 13 J/cm2 with three adjustable parameters.

Low-Temperature Photoluminescence of Nanostructured ZnO Crystal Synthesized by Pulsed-Laser Ablation

2009 ◽  
Vol 48 (8) ◽  
pp. 085001 ◽  
Author(s):  
Kentaro Sakai ◽  
Kohei Noguchi ◽  
Atsuhiko Fukuyama ◽  
Tetsuo Ikari ◽  
Tatsuo Okada
Keyword(s):  
Laser Ablation ◽  
Low Temperature ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Zno Crystal ◽  
Low Temperature Photoluminescence
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