Measurement of local stress in silicon nitride films grown by plasma‐enhanced chemical vapor deposition using micro‐Raman spectroscopy
2007 ◽
Vol 38
(1-2)
◽
pp. 148-151
◽
1990 ◽
Vol 29
(Part 1, No. 5)
◽
pp. 918-922
◽
Preparation of Plasma Chemical Vapor Deposition Silicon Nitride Films from SiH2F2and NH3Source Gases
1991 ◽
Vol 30
(Part 2, No. 4A)
◽
pp. L619-L621
◽
2005 ◽
Vol 23
(2)
◽
pp. 248-255
◽