A computerized direct liquid injection, rapid isothermal processing assisted chemical vapor deposition system for a Teflon amorphous fluoropolymer

1997 ◽  
Vol 68 (3) ◽  
pp. 1564-1570 ◽  
Author(s):  
R. Sharangpani ◽  
R. Singh
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Liquid Injection ◽  
Direct Liquid Injection ◽  
Rapid Isothermal Processing

A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films

2017 ◽  
Vol 19 (8) ◽  
pp. 1700193 ◽  
Author(s):  
Mattias Vervaele ◽  
Bert De Roo ◽  
Jolien Debehets ◽  
Marilyne Sousa ◽  
Luman Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Liquid Injection ◽  
Pressure Chemical ◽  
Direct Liquid Injection

scholarly journals Optimization of Carbon Nanotube-Coated Monolith by Direct Liquid Injection Chemical Vapor Deposition Based on Taguchi Method

Catalysts ◽  
2020 ◽  
Vol 10 (1) ◽  
pp. 67 ◽  
Author(s):  
Omar Qistina ◽  
Ali Salmiaton ◽  
Thomas S.Y. Choong ◽  
Yun Hin Taufiq-Yap ◽  
Shamsul Izhar
Keyword(s):  
Chemical Vapor Deposition ◽  
Optimum Condition ◽  
Taguchi Method ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Ni Catalyst ◽  
Carbon Yield ◽  
X Ray ◽  
Liquid Injection ◽  
Direct Liquid Injection

Carbon nanotubes (CNTs) have the potential to act as a catalyst support in many sciences and engineering fields due to their outstanding properties. The CNT-coated monolith was synthesized over a highly active Ni catalyst using direct liquid injection chemical vapor deposition (CVD). The aim was to study the optimum condition for synthesizing CNT-coated monoliths. The Taguchi method with L9 (34) orthogonal array design was employed to optimize the experimental conditions of CNT-coated monoliths. The design response was the percentage of carbon yield expressed by the signal-to-noise (S/N) value. The parameters including the mass ratio of Ni to citric acid (Ni:CA) (A), the injection rate of carbon source (B), time of reaction (C), and operating temperature (D) were selected at three levels. The results showed that the optimum conditions for CNT-coated monolith were established at A1B2C1D2 and the most influential parameter was D followed by B, C, and A. The ANOVA analysis showed the design was significant with R-squared and standard deviation of the factorial model equal to 0.9982 and 0.22, respectively. A confirmation test was conducted to confirm the optimum condition with the actual values of the average percentage of carbon yield deviated 1.4% from the predicted ones. The CNT-coated monoliths were characterized by various techniques such as field emission scanning electron microscopy (FESEM), energy dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), and Raman spectroscopy.

scholarly journals Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD)[sub 3] (OD=octanedionate)

2000 ◽  
Vol 18 (5) ◽  
pp. 2400 ◽  
Author(s):  
Jung-Hyun Lee ◽  
Joo-Young Kim ◽  
Shi-Woo Rhee ◽  
DooYoung Yang ◽  
Dong-Hyun Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Liquid Injection ◽  
Direct Liquid Injection

Direct Liquid Injection − Low Pressure Chemical Vapor Deposition of Silica Thin Films from Di-t-butoxydiacetoxysilane

2017 ◽  
Vol 19 (12) ◽  
pp. 1700425 ◽  
Author(s):  
Mattias Vervaele ◽  
Bert De Roo ◽  
Jolien Debehets ◽  
Marilyne Sousa ◽  
Luman Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silica Thin Films ◽  
Liquid Injection ◽  
Pressure Chemical ◽  
Direct Liquid Injection
Sign in / Sign up

Export Citation Format

Share Document