Low temperature deposition of patterned TiO2 thin films using photopatterned self‐assembled monolayers

1996 ◽  
Vol 69 (6) ◽  
pp. 860-862 ◽  
Author(s):  
Rochael J. Collins ◽  
Hyunjung Shin ◽  
Mark R. DeGuire ◽  
Arthur H. Heuer ◽  
Chaim N. Sukenik
1996 ◽  
Vol 156 (2) ◽  
pp. 381-385 ◽  
Author(s):  
Qianwang Chen ◽  
Yitai Qian ◽  
Zuyao Chen ◽  
Yunbo Jia ◽  
Guien Zhou ◽  
...  

1995 ◽  
Vol 10 (3) ◽  
pp. 692-698 ◽  
Author(s):  
H. Shin ◽  
R.J. Collins ◽  
M.R. De Guire ◽  
A.H. Heuer ◽  
C.N. Sukenik

Self-assembled monolayers (SAMs) bearing sulfonate (-SO3H) surface functional groups, on single-crystal Si wafers, were used as substrates for the deposition of TiO2 thin films from aqueous solutions. Polycrystalline TiO2 thin films over 50 nm thick formed in 2 h by hydrolysis of TiCl4 in aqueous HCI solutions at 80 °C. The films were pore-free, showed excellent adherence and uniformity, and consisted of anatase crystallites 2–4 nm in diameter. Annealing at temperatures up to 600 °C caused coarsening of the anatase grains, but no loss of adherence or structural integrity.


2012 ◽  
Vol 520 (10) ◽  
pp. 3736-3740 ◽  
Author(s):  
Yoji Yasuda ◽  
Kento Kamikuri ◽  
Masayuki Tobisaka ◽  
Yoichi Hoshi

2009 ◽  
Vol 25 (1) ◽  
pp. 83-86 ◽  
Author(s):  
Guo-Qiang TAN ◽  
Hai-Yang BO ◽  
Hong-Yan MIAO ◽  
Ao XIA ◽  
Zhong-Liang HE

Langmuir ◽  
2020 ◽  
Vol 36 (31) ◽  
pp. 9259-9268 ◽  
Author(s):  
Takashi Ito ◽  
Herman Coceancigh ◽  
Yi Yi ◽  
Jay N. Sharma ◽  
Fred C. Parks ◽  
...  

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