Corrigendum to “Low-temperature deposition of (1 1 0) and (1 0 1) rutile TiO2 thin films using dual cathode DC unbalanced magnetron sputtering for inducing hydroxyapatite” [Mater. Chem. Phys. 117 (2009) 288–293]

2010 ◽  
Vol 120 (1) ◽  
pp. 229 ◽  
Author(s):  
Prasertsak Kasemanankul ◽  
Nirun Witit-Anan ◽  
Surasing Chaiyakun ◽  
Pichet Limsuwan ◽  
Virote Boonamnuayvitaya
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Chem Phys ◽  
Tio2 Thin Films ◽  
Rutile Tio2 ◽  
Unbalanced Magnetron Sputtering ◽  
Low Temperature Deposition ◽  
Unbalanced Magnetron ◽  
Temperature Deposition

Low-temperature deposition of ultrafine rutile TiO2 thin films by the hydrothermal method

1996 ◽  
Vol 156 (2) ◽  
pp. 381-385 ◽  
Author(s):  
Qianwang Chen ◽  
Yitai Qian ◽  
Zuyao Chen ◽  
Yunbo Jia ◽  
Guien Zhou ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Hydrothermal Method ◽  
Tio2 Thin Films ◽  
Rutile Tio2 ◽  
Low Temperature Deposition ◽  
Temperature Deposition

NANOSTRUCTURE OF TiO2 THIN FILMS PREPARED BY UNBALANCED MAGNETRON SPUTTERING

2009 ◽  
Vol 23 (10) ◽  
pp. 2395-2403
Author(s):  
ARTORN POKAIPISIT ◽  
SURASING CHAIYAKUN ◽  
PICHET LIMSUWAN ◽  
BOONLAER NGOTAWORNCHAI
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Anatase Phase ◽  
Tio2 Thin Films ◽  
Glass Substrates ◽  
Selected Area Electron Diffraction ◽  
Unbalanced Magnetron Sputtering ◽  
Transmission Electron ◽  
Unbalanced Magnetron ◽  
20 Nm

In this study, titanium dioxide ( TiO 2) thin films were deposited on unheated glass substrates using an unbalanced magnetron sputtering system with different deposition times of 25, 35 and 45 min, respectively. The structure and surface morphology of TiO 2 thin films were characterized by atomic force microscopy (AFM) and transmission electron microscopy (TEM) with selected-area electron diffraction (SAED). It was found that the crystallite size of TiO 2 thin films was in the range of 10–20 nm, and the surface roughness was 1–3 nm. The SAED patterns show that the phase of TiO 2 thin films obtained in this study is anatase phase.

Development and utility of a new 3-D magnetron source for high rate deposition of highly conductive ITO thin films near room temperature

2018 ◽  
Vol 20 (7) ◽  
pp. 4818-4830 ◽  
Author(s):  
Long Wen ◽  
Bibhuti Bhusan Sahu ◽  
Jeon Geon Han
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
High Rate ◽  
High Quality ◽  
Low Temperature Deposition ◽  
Ito Thin Films ◽  
Temperature Deposition ◽  
Ito Films

This study reports the high rate and low-temperature deposition of high-quality ITO films using a new 3-D confined magnetron sputtering method.

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