Characterization of electron emission from planar amorphous carbon thin films using in situ scanning electron microscopy

1997 ◽  
Vol 70 (15) ◽  
pp. 1995-1997 ◽  
Author(s):  
N. Missert ◽  
T. A. Friedmann ◽  
J. P. Sullivan ◽  
R. G. Copeland
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
Amorphous Carbon ◽  
Electron Emission ◽  
Carbon Thin Films ◽  
Scanning Electron

Nanoscale scanning electron microscopy based graphitization in tetrahedral amorphous carbon thin films

Carbon ◽  
2016 ◽  
Vol 107 ◽  
pp. 536-541 ◽  
Author(s):  
F. Klein ◽  
U. Treske ◽  
A. Koitzsch ◽  
D.R. Cavicchia ◽  
C. Thönnißen ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
Amorphous Carbon ◽  
Tetrahedral Amorphous Carbon ◽  
Carbon Thin Films ◽  
Scanning Electron

scholarly journals Design and Characterization of Microscale Auxetic and Anisotropic Structures Fabricated by Multiphoton Lithography

Nanomaterials ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 446
Author(s):  
Ioannis Spanos ◽  
Zacharias Vangelatos ◽  
Costas Grigoropoulos ◽  
Maria Farsari
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Mechanical Performance ◽  
Element Analysis ◽  
Mechanical Responses ◽  
Multiphoton Lithography ◽  
Anisotropic Structures ◽  
Scanning Electron

The need for control of the elastic properties of architected materials has been accentuated due to the advances in modelling and characterization. Among the plethora of unconventional mechanical responses, controlled anisotropy and auxeticity have been promulgated as a new avenue in bioengineering applications. This paper aims to delineate the mechanical performance of characteristic auxetic and anisotropic designs fabricated by multiphoton lithography. Through finite element analysis the distinct responses of representative topologies are conveyed. In addition, nanoindentation experiments observed in-situ through scanning electron microscopy enable the validation of the modeling and the observation of the anisotropic or auxetic phenomena. Our results herald how these categories of architected materials can be investigated at the microscale.

Fabrication of Ultra Thick Ferromagnetic Structures in Silicon

2004 ◽  
Author(s):  
Debbie G. Jones ◽  
Albert P. Pisano
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
Saturation Magnetization ◽  
Silicon Wafer ◽  
Fabrication Process ◽  
Sem Images ◽  
Deep Reactive Ion Etching ◽  
Scanning Electron

A novel fabrication process is presented to create ultra thick ferromagnetic structures in silicon. The structures are fabricated by electroforming NiFe into silicon templates patterned with deep reactive ion etching (DRIE). Thin films are deposited into photoresist molds for characterization of an electroplating cell. Results show that electroplated films with a saturation magnetization above 1.6 tesla and compositions of approximately 50/50 NiFe can be obtained through agitation of the electrolyte. Scanning electron microscopy (SEM) images show that NiFe structures embedded in a 500 μm thick silicon wafer are realized and the roughening of the mold sidewalls during the DRIE aids in adhesion of the NiFe to the silicon.

Formation and Characterization of the Quasicrystal Films

2007 ◽  
Vol 546-549 ◽  
pp. 1699-1702
Author(s):  
Xi Ying Zhou ◽  
Liang He ◽  
Yan Hui Liu
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
Electric Current ◽  
Wear Behavior ◽  
Micro Hardness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Scanning Electron

Al-Cu-Fe quasicrystals powder was used to prepare the thin films on the surface of the A3 steel by the means of DMD-450 vacuum evaporation equipment. The thin films with different characterization were obtained through different parameters. The microstructures of the thin films were analyzed by Scanning Electron Microscopy (SEM) and X-ray Diffraction (XRD). Additionally, the nano-hardness and the modulus of the films are tested by MTS and Neophot micro-hardness meter. The results showed that the modulus of the films was about 160GPa. Nano hardness of the films was about 7.5 Gpa. The films consisted of CuAl2, AlCu3. The thickness and the micro-hardness of the films are improved. In same way, with the increase of the electric current, the thickness and the hardness of the films are also improved. Along with increase of the time and the electric current, the wear behavior of the films was improved. To some extent, the microstructure of films contained the quasicrystal phase of Al65Cu20Fe15.

Sol-Gel Synthesis and Characterization of BiFeO3-PbTiO3 Thin Films

2007 ◽  
Vol 997 ◽  
Author(s):  
Ashish Garg ◽  
Soumya Kar ◽  
Anju Dixit ◽  
D C Agrawal
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
Sol Gel ◽  
Grazing Incidence ◽  
Synthesis And Characterization ◽  
Sol Gel Synthesis ◽  
Polycrystalline Form ◽  
Scanning Electron

AbstractIn this work, we report on the synthesis and characterization of thin films of (BiFeO3)1−x (PbTiO3)x (BFPT) solid solutions of compositions around morphotropic phase boundary (MPB) grown on platinized silicon (111) Pt/TiO2/SiO2/Si substrate by sol-gel based spin coating technique. The films were post-annealed at 700 and 750°C for 1 h in air. Morphological analysis of the films was carried out by scanning electron microscopy. Grazing incidence X-ray diffractometry revealed the perovskite structure of the films and peaks suggested the presence of rhombohedral structured pure BFPT phase in polycrystalline form. Scanning electron microscopy suggested that films annealed at 750degC had a denser microstructure as compared to those at 700°C. The room temperature dielectric constant of the films with composition of BF:PT :: 75:25 was measured to be ∼1200 at a frequency of 100 kHz.

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