Time-resolved photoluminescence spectra of strong visible light-emitting SiC nanocrystalline films on Si deposited by electron-cyclotron-resonance chemical-vapor deposition

Applied Physics Letters ◽

10.1063/1.126382 ◽

2000 ◽

Vol 76 (18) ◽

pp. 2550-2552 ◽

Author(s):

S. J. Xu ◽

M. B. Yu ◽

Rusli ◽

S. F. Yoon ◽

C. M. Che

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Photoluminescence Spectra ◽

Nanocrystalline Films ◽

Time Resolved ◽

Light Emitting ◽

Time Resolved Photoluminescence

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Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Evolution of structure in thin microcrystalline silicon films grown by electron-cyclotron resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1289783 ◽

2000 ◽

Vol 88 (7) ◽

pp. 4376 ◽

Author(s):

M. Birkholz ◽

B. Selle ◽

E. Conrad ◽

K. Lips ◽

W. Fuhs

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Evolution Of Structure

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c-Axis oriented AlN films prepared on diamond film substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(01)01810-3 ◽

2002 ◽

Vol 235 (1-4) ◽

pp. 333-339 ◽

Author(s):

H Gong ◽

X Jiang

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Film Substrate ◽

Resonance Plasma

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In situ investigation of the passivation of Si and Ge by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiO2

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589211 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1687 ◽

Author(s):

Y. Wang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

In Situ Investigation ◽

Resonance Plasma

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Low‐temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114962 ◽

1995 ◽

Vol 67 (7) ◽

pp. 971-973 ◽

Author(s):

J. L. Rogers ◽

P. S. Andry ◽

W. J. Varhue ◽

P. McGaughnea ◽

E. Adams ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Homoepitaxial Growth ◽

Resonance Plasma

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Preparation of Bismuth Titanate Films by Electron Cyclotron Resonance Plasma Sputtering-Chemical Vapor Deposition

Journal de Physique IV (Proceedings) ◽

10.1051/jphyscol:1995580 ◽

1995 ◽

Vol 05 (C5) ◽

pp. C5-671-C5-677

Author(s):

H. Masumoto ◽

T. Hirai

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Bismuth Titanate ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

Journal of Applied Physics ◽

10.1063/1.1500418 ◽

2002 ◽

Vol 92 (5) ◽

pp. 2937-2941 ◽

Author(s):

K. Chew ◽

Rusli ◽

S. F. Yoon ◽

J. Ahn ◽

V. Ligatchev ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Author(s):

OLEG A. POPOV

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Graphitic solid core carbon nanorods grown on silica sands using electron cyclotron resonance chemical vapor deposition as a highly efficient and green sorbent for removal of phenol derivatives from water sources

Journal of the Chinese Chemical Society ◽

10.1002/jccs.201900112 ◽

2019 ◽

Vol 67 (4) ◽

pp. 576-584

Author(s):

Samira Mehmanravesh ◽

Khalil Farhadi ◽

Ali Torabian ◽

Amirhesam Hasani

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Water Sources ◽

Electron Cyclotron ◽

Phenol Derivatives ◽

Highly Efficient

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Characteristics of amorphous and polycrystalline silicon films deposited at 120 °C by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581195 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1912-1916 ◽

Author(s):

Sanghoon Bae ◽

A. Kaan Kalkan ◽

Shangcong Cheng ◽

Stephen J. Fonash

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Polycrystalline Silicon ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Polycrystalline Silicon Films ◽

Resonance Plasma

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