Effect of high-voltage sheath electric field and ion-enhanced etching on growth of carbon nanofibers in high-density plasma chemical-vapor deposition

2005 ◽  
Vol 98 (4) ◽  
pp. 044313 ◽  
Author(s):  
H. W. Wei ◽  
K. C. Leou ◽  
M. T. Wei ◽  
Y. Y. Lin ◽  
C. H. Tsai
Keyword(s):  
Chemical Vapor Deposition ◽  
Electric Field ◽  
Carbon Nanofibers ◽  
High Voltage ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Density Plasma

Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation

2002 ◽  
Vol 41 (Part 1, No. 4A) ◽  
pp. 1974-1980 ◽  
Author(s):  
Shigeru Kinoshita ◽  
Shigeyuki Takagi ◽  
Hidehiko Yabuhara ◽  
Hiroshi Nishimura ◽  
Hideichi Kawaguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Calibration Method ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Deposition Simulation ◽  
Density Plasma
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