The comparison of the growth models of silicon nitride ultrathin films fabricated using atmospheric pressure plasma and radio frequency plasma

2007 ◽  
Vol 101 (2) ◽  
pp. 023513 ◽  
Author(s):  
Mari Nakae ◽  
Ryoma Hayakawa ◽  
Takeshi Yoshimura ◽  
Norifumi Fujimura ◽  
Shunsuke Kunugi ◽  
...  
2007 ◽  
Vol 364-366 ◽  
pp. 340-345 ◽  
Author(s):  
Ju Fan Zhang ◽  
Bo Wang ◽  
Shen Dong

As there are always certain defects on the final surface of large-scale lightweight mirrors, which are formed in traditional mechanical polishing process, such as microcracks, lattice disturbances, plastic deformation, and so on, an atmospheric pressure plasma polishing method is a good solution to this problem. As a key component, the design of the capacitance coupling atmospheric pressure radio-frequency plasma torch is introduced. The designed torch uses water cooled coaxial aluminium electrodes with special treatment to avoid arcing between them. In normal machining process, the mixture of reaction gas and plasma gas with optimum ratio is input into the plasma torch. Then, excited by radio-frequency power, reaction gas is ionized in the plasma so as to create high density and energy reactive radicals under atmospheric pressure. The radicals cause chemical reactions with the atoms on the part surface, which performs an effective atomscale removal process. As the machining process is chemical in nature, this method avoids surface/subsurface defects mentioned above. Furthermore, initial experiment data analysis has proved that the atmospheric pressure plasma polishing method is effective and reliable, as well as demonstrates the validity of the designed plasma torch.


2009 ◽  
Vol 162 ◽  
pp. 012013 ◽  
Author(s):  
L Schaper ◽  
S Reuter ◽  
J Waskoenig ◽  
K Niemi ◽  
V Schulz-von der Gathen ◽  
...  

2017 ◽  
Vol 50 (45) ◽  
pp. 455204 ◽  
Author(s):  
J Dedrick ◽  
S Schröter ◽  
K Niemi ◽  
A Wijaikhum ◽  
E Wagenaars ◽  
...  

2008 ◽  
Vol 80 (9) ◽  
pp. 1931-1937 ◽  
Author(s):  
Hana Baránková ◽  
Ladislav Bardos

Generation and features of the radio frequency (RF) hollow cathode discharge (HCD) are compared for the atmospheric and moderate pressures. The atmospheric-pressure plasma systems, fused hollow cathode (FHC) and hybrid hollow electrode-activated discharge (H-HEAD), are described. Examples of applications where both FHC and H-HEAD have already been employed are given, and potentials for new processes are discussed.


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