Plasma ion implantation of nitrogen into silicon: Characterization of the depth profiles of implanted ions
1998 ◽
Vol 285
(3-4)
◽
pp. 216-220
◽
2019 ◽
Vol 552
◽
pp. 209-213
◽
1993 ◽
Vol 80-81
◽
pp. 632-635