Threshold voltage control by gate oxide thickness in fluorinated GaN metal-oxide-semiconductor high-electron-mobility transistors
2013 ◽
Vol 103
(3)
◽
pp. 033524
◽
Yuhao Zhang
◽
Min Sun
◽
Sameer J. Joglekar
◽
Tatsuya Fujishima
◽
Tomás Palacios
2013 ◽
Vol 52
(8S)
◽
pp. 08JN08
◽
Milan Ťapajna
◽
Ján Kuzmík
Han-Yin Liu
◽
Chih-Wei Lin
◽
Ching-Sung Lee
◽
Wei-Chou Hsu
2012 ◽
Vol 520
(19)
◽
pp. 6230-6232
◽
A. Alexewicz
◽
C. Ostermaier
◽
C. Henkel
◽
O. Bethge
◽
J.-F. Carlin
◽
...
2017 ◽
Vol 122
(22)
◽
pp. 224504
◽
M. Matys
◽
S. Kaneki
◽
K. Nishiguchi
◽
B. Adamowicz
◽
T. Hashizume
2013 ◽
Vol 102
(10)
◽
pp. 103504
◽
X. Sun
◽
O. I. Saadat
◽
K. S. Chang-Liao
◽
T. Palacios
◽
S. Cui
◽
...
2016 ◽
Vol 34
(5)
◽
pp. 051202
◽
Shihyun Ahn
◽
Byung-Jae Kim
◽
Yi-Hsuan Lin
◽
Fan Ren
◽
Stephen J. Pearton
◽
...
2012 ◽
Vol 100
(11)
◽
pp. 113509
◽
2003 ◽
Vol 82
(15)
◽
pp. 2530-2532
◽
R. Mehandru
◽
B. Luo
◽
J. Kim
◽
F. Ren
◽
B. P. Gila
◽
...
2018 ◽
Vol 124
(16)
◽
pp. 165704
◽
Jaya Jha
◽
Bhanu B. Upadhyay
◽
Kuldeep Takhar
◽
Navneet Bhardwaj
◽
Swaroop Ganguly
◽
...
D. K. Panda
◽
G. Amarnath
◽
T. R. Lenka