scholarly journals Threshold voltage control by gate oxide thickness in fluorinated GaN metal-oxide-semiconductor high-electron-mobility transistors

2013 ◽  
Vol 103 (3) ◽  
pp. 033524 ◽  
Author(s):  
Yuhao Zhang ◽  
Min Sun ◽  
Sameer J. Joglekar ◽  
Tatsuya Fujishima ◽  
Tomás Palacios
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