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2015 ◽  
Vol 107 (18) ◽  
pp. 183509 ◽  
Author(s):  
Donghyi Koh ◽  
Seung Heon Shin ◽  
Jaehyun Ahn ◽  
Sushant Sonde ◽  
Hyuk-Min Kwon ◽  
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Keyword(s):  
Metal Oxide ◽  
Surface Treatment ◽  
Semiconductor Device ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Plasma Surface ◽  
Ion Plasma ◽  
Plasma Surface Treatment

Thin germanium-carbon alloy layers grown directly on silicon for metal-oxide-semiconductor device applications

2006 ◽  
Vol 88 (15) ◽  
pp. 152101 ◽  
Author(s):  
D. Q. Kelly ◽  
I. Wiedmann ◽  
J. P. Donnelly ◽  
S. V. Joshi ◽  
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Keyword(s):  
Metal Oxide ◽  
Semiconductor Device ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
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scholarly journals Efficient ultraviolet electroluminescence from a Gd-implanted silicon metal–oxide–semiconductor device

2004 ◽  
Vol 85 (16) ◽  
pp. 3387-3389 ◽  
Author(s):  
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W. Skorupa ◽  
T. Dekorsy ◽  
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Keyword(s):  
Metal Oxide ◽  
Semiconductor Device ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor
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