Silicide formation by thermal annealing of Ni and Pd on hydrogenated amorphous silicon films

1985 ◽  
Vol 47 (3) ◽  
pp. 236-238 ◽  
Author(s):  
L. S. Hung ◽  
E. F. Kennedy ◽  
C. J. Palmstro/m ◽  
J. O. Olowolafe ◽  
J. W. Mayer ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Thermal Annealing ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
Silicide Formation ◽  
Hydrogenated Amorphous

Photoconductivity and trapping parameters in hydrogenated amorphous silicon films

1983 ◽  
Vol 9 (1-3) ◽  
pp. 295-300
Author(s):  
S. Galassini ◽  
G. Micocci ◽  
C. Pennetta ◽  
A. Rizzo ◽  
A. Tepore ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
Hydrogenated Amorphous

Substrate temperature effect on the stability of hydrogenated amorphous silicon films deposited at high rates

1995 ◽  
Vol 78 (1) ◽  
pp. 317-320 ◽  
Author(s):  
J. P. Kleider ◽  
C. Longeaud ◽  
M. Barranco‐Diaz ◽  
P. Morin ◽  
P. Roca i Cabarrocas
Keyword(s):  
Substrate Temperature ◽  
Temperature Effect ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
The Stability ◽  
Hydrogenated Amorphous
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