scholarly journals Enhanced cavity coupling to silicon vacancies in 4H silicon carbide using laser irradiation and thermal annealing

2021 ◽  
Vol 118 (12) ◽  
pp. e2021768118
Author(s):  
Mena N. Gadalla ◽  
Andrew S. Greenspon ◽  
Rodrick Kuate Defo ◽  
Xingyu Zhang ◽  
Evelyn L. Hu

The negatively charged silicon monovacancy VSi− in 4H silicon carbide (SiC) is a spin-active point defect that has the potential to act as a qubit in solid-state quantum information applications. Photonic crystal cavities (PCCs) can augment the optical emission of the VSi−, yet fine-tuning the defect–cavity interaction remains challenging. We report on two postfabrication processes that result in enhancement of the V1′ optical emission from our PCCs, an indication of improved coupling between the cavity and ensemble of silicon vacancies. Below-bandgap irradiation at 785-nm and 532-nm wavelengths carried out at times ranging from a few minutes to several hours results in stable enhancement of emission, believed to result from changing the relative ratio of VSi0 (“dark state”) to VSi− (“bright state”). The much faster change effected by 532-nm irradiation may result from cooperative charge-state conversion due to proximal defects. Thermal annealing at 100 °C, carried out over 20 min, also results in emission enhancements and may be explained by the relatively low-activation energy diffusion of carbon interstitials Ci, subsequently recombining with other defects to create additional VSi−s. These PCC-enabled experiments reveal insights into defect modifications and interactions within a controlled, designated volume and indicate pathways to improved defect–cavity interactions.

2017 ◽  
Vol 114 (16) ◽  
pp. 4060-4065 ◽  
Author(s):  
David O. Bracher ◽  
Xingyu Zhang ◽  
Evelyn L. Hu

Point defects in silicon carbide are rapidly becoming a platform of great interest for single-photon generation, quantum sensing, and quantum information science. Photonic crystal cavities (PCCs) can serve as an efficient light–matter interface both to augment the defect emission and to aid in studying the defects’ properties. In this work, we fabricate 1D nanobeam PCCs in 4H-silicon carbide with embedded silicon vacancy centers. These cavities are used to achieve Purcell enhancement of two closely spaced defect zero-phonon lines (ZPL). Enhancements of >80-fold are measured using multiple techniques. Additionally, the nature of the cavity coupling to the different ZPLs is examined.


2008 ◽  
Vol 516 (12) ◽  
pp. 3855-3861 ◽  
Author(s):  
Kun Xue ◽  
Li-Sha Niu ◽  
Hui-Ji Shi ◽  
Jiwen Liu

2018 ◽  
Vol 113 (23) ◽  
pp. 231106 ◽  
Author(s):  
Bong-Shik Song ◽  
Seungwoo Jeon ◽  
Heungjoon Kim ◽  
Dongyeon Daniel Kang ◽  
Takashi Asano ◽  
...  

2015 ◽  
Vol 821-823 ◽  
pp. 468-471 ◽  
Author(s):  
Yuki Mori ◽  
Mieko Matsumura ◽  
Hirotaka Hamamura ◽  
Toshiyuki Mine ◽  
Akio Shima ◽  
...  

The mechanism of dielectric breakdown of oxide on step-bunching of 4H-silicon carbide (SiC) was investigated. Comparing the surface morphology obtained before forming metal-oxide-semiconductor (MOS) capacitor and optical emission on the capacitor under electrical stress, it was cleared that current concentrates on step-bunching and it often caused preferential dielectric breakdown. Based on TEM analysis and the observation of time dependence of emission under the stress, a new model was proposed to explain the dielectric breakdown on step-bunching.


Sign in / Sign up

Export Citation Format

Share Document