Chemical Reactions During Wet-Etching Process of LSMO/PZT/LSMO-Structured Device Fabrication

2009 ◽  
Vol 380 (1) ◽  
pp. 97-101 ◽  
Author(s):  
Tsung-Her Yeh ◽  
M. B. Suresh ◽  
Jun-Nan Shen ◽  
Jyh-Cheng Yu ◽  
Chen-Chia Chou
2010 ◽  
Vol 518 (8) ◽  
pp. 2147-2151
Author(s):  
Abderrafia Moujoud ◽  
Sungho Kang ◽  
Hyun Jae Kim ◽  
Mark Andrews

2004 ◽  
Vol 68 (1) ◽  
pp. 221-228
Author(s):  
YOSHIOMI HIRANAGA ◽  
YASUO WAGATSUMA ◽  
YASUO CHO

2004 ◽  
Author(s):  
Min Xiang ◽  
Yanmin Cai ◽  
Yaming Wu ◽  
Jianyi Yang ◽  
Yuelin Wang

1997 ◽  
Vol 36 (Part 1, No. 6A) ◽  
pp. 3576-3579
Author(s):  
Yu Ho Jung ◽  
Byeong Kwon Ju ◽  
Jae Hoon Jung ◽  
Yun Hi Lee ◽  
Myung Hwan Oh ◽  
...  

2016 ◽  
Vol 255 ◽  
pp. 18-21
Author(s):  
Yong Gen He ◽  
Huan Xin Liu ◽  
Jia Lei Liu ◽  
Jin Gang Wu ◽  
Christian Haigermoser ◽  
...  

Tetramethylammonium hydroxide (TMAH) is a common etchant for Sigma shape formation in IC manufacturing. The impact of oxygen dissolved in TMAH solution on process was studied in this paper. A novel O2 gas injector was developed to improve the process stabilization by control of the oxygen concentration in TMAH solution


2009 ◽  
Vol 517 (9) ◽  
pp. 2900-2904 ◽  
Author(s):  
Yasuhiro Saito ◽  
Shinya Okamoto ◽  
Hiroyuki Inomata ◽  
Junji Kurachi ◽  
Takeshi Hidaka ◽  
...  

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