Low Temperature Deposited BST Thin Films for RF MEMS Switch

2010 ◽  
Vol 116 (1) ◽  
pp. 35-40
Author(s):  
Radhapiyari Laishram ◽  
O. P. Thakur ◽  
D. K. Bhattacharya ◽  
Harsh ◽  
Anshu Goyal ◽  
...  
2004 ◽  
Vol 2004.7 (0) ◽  
pp. 359-360
Author(s):  
Hironobu ENDO ◽  
Takaaki SUZUKI ◽  
Isaku KANNO ◽  
Hidetoshi KOTERA

2005 ◽  
Vol 2005.80 (0) ◽  
pp. _9-35_-_9-36_
Author(s):  
Hironobu ENDO ◽  
Yoshiro TAZAWA ◽  
Takaaki SUZUKI ◽  
Isaku KANNO ◽  
Hidetoshi KOTERA

Author(s):  
D. Vasilache ◽  
A. Avram ◽  
A. Stefanescu ◽  
G. Boldeiu ◽  
S Iordanescu ◽  
...  

2021 ◽  
Vol 34 (3) ◽  
pp. 381-392
Author(s):  
Lakshmi Thalluri ◽  
K.V.V. Kumar ◽  
Konari Sekhar ◽  
Bhushana Babu ◽  
S.S. Kiran ◽  
...  

This paper describes the significance of the iterative approach and the structure damping analysis which help to get better the performance and validation of shunt capacitive RF MEMS switch. The micro-cantilever based electrostatic ally actuated shunt capacitive RF MEMS switch is designed and after multiple iterations on cantilever structure a modification of the structure is obtained that requires low actuation voltage of 7.3 V for 3 ?m deformation. To validate the structure we have performed the damping analysis for each iteration. The low actuation voltage is a consequence of identifying the critical membrane thickness of 0.7 ?m, and incorporating two slots and holes into the membrane. The holes to the membrane help in stress distribution. We performed the Eigen frequency analysis of the membrane. The RF MEMS switch is micro machined on a CPW transmission line with Gap- Strip-Gap (G-S-G) of 85 ?m - 70 ?m - 85 ?m. The switch RF isolation properties are analyzed with high dielectric constant thin films i.e., AlN, GaAs, and HfO2. For all the dielectric thin films the RF MEMS switch shows a high isolation of -63.2 dB, but there is shift in the radio frequency. Because of presence of the holes in the membrane the switch exhibits a very low insertion loss of -0.12 dB.


2014 ◽  
Vol 62 (7) ◽  
pp. 1437-1447 ◽  
Author(s):  
Sara S. Attar ◽  
Sormeh Setoodeh ◽  
Raafat R. Mansour ◽  
Deepnarayan Gupta

2020 ◽  
Vol 12 ◽  
Author(s):  
Pampa Debnath ◽  
Ujjwal Mondal ◽  
Arpan Deyasi

Aim:: Computation of loss factors for one-bit RF MEMS switch over Ku, K and Ka-band for two different insulating substrates. Objective:: Numerical investigation of return loss, insertion loss, isolation loss are computed under both actuated and unactuated states for two different insulating substrates of the 1-bit RF MEMS switch, and corresponding up and down-capacitances are obtained. Methods:: The unique characteristics of a 1-bit RF MEMS switch of providing higher return loss under both actuated and unactuated states and also of isolation loss with negligible insertion loss makes it as a prime candidate for phase shifter application. This is presented in this manuscript with a keen focus on improvement capability by changing transmission line width, and also of overlap area; where dielectric constant of the substrate also plays a vital role. Results:: The present work exhibits very low down-capacitance over the spectrum whereas considerable amount of up-capacitance. Also when overall performance in terms of all loss parameters are considered, switch provides very low insertion loss, good return loss under actuated state and standard isolation loss. Conclusion:: Reduction of transmission line width of about 33% improved the performance of the switch by increasing isolation loss. Isolation loss of -40 dB is obtained at actuated condition in higher microwave spectra for SiO 2 at higher overlap area. Down capacitance of ~ 1dB is obtained which is novel as compared with other published literature. Moreover, a better combination of both return loss, isolation loss and insertion loss are reported in this present work compared with all other published data so far.


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