Structures and Properties of Zr–N Films Prepared by ECR-Microwave Plasma Source Enhanced Direct-Current Magnetron Sputtering Under Different N
2
Partial Pressures
2004 ◽
Vol 21
(10)
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pp. 2008-2011
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Keyword(s):
1992 ◽
Vol 10
(6)
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pp. 3439-3444
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