Impurity-induced disorder in strained InGaAs/GaAs quantum wells by Zn diffusion and thermal annealing

1992 ◽  
Vol 7 (6) ◽  
pp. 744-751 ◽  
Author(s):  
M T Furtado ◽  
M S S Loural ◽  
E A Sato ◽  
M A Sacilotti
2013 ◽  
Vol 1617 ◽  
pp. 43-48
Author(s):  
R. Cisneros Tamayo ◽  
I.J. Gerrero Moreno ◽  
A. Vivas Hernandez ◽  
J.L. Casas Espinola ◽  
L. Shcherbyna

ABSTRACTThe photoluminescence (PL), its temperature dependence and X-ray diffraction (XRD) have been studied in MBE grown GaAs/AlGaAs/InGaAs/AlGaAs /GaAs quantum wells (QWs) with InAs quantum dots embedded in the center of InGaAs layer in the freshly prepared states and after the thermal treatments during 2 hours at 640 or 710 °C. The structures contained two buffer (Al0.3Ga0.7As/In0.15Ga0.85As) and two capping (In0.15Ga0.85As / Al0.3Ga0.7As) layers. The temperature dependences of PL peak positions have been analyzed in the temperature range 10-500K with the aim to investigate the QD composition and its variation at thermal annealing. The experimental parameters of the temperature variation of PL peak position in the InAs QDs have been compared with the known one for the bulk InAs crystals and the QD composition variation due to Ga/Al/In inter diffusion at thermal treatments has been detected. XRD have been studied with the aim to estimate the capping/buffer layer compositions in the different QW layers in freshly prepared state and after the thermal annealing. The obtained emission and XRD data and their dependences on the thermal treatment have been analyzed and discussed.


2020 ◽  
Vol 846 ◽  
pp. 155698
Author(s):  
Miguel Ulises Salazar-Tovar ◽  
Frantisek Sutara ◽  
Isaac Hernández-Calderón

1999 ◽  
Vol 38 (Part 2, No. 3B) ◽  
pp. L298-L300 ◽  
Author(s):  
Takeo Kageyama ◽  
Tomoyuki Miyamoto ◽  
Shigeki Makino ◽  
Fumio Koyama ◽  
Kenichi Iga

1994 ◽  
Vol 64 (6) ◽  
pp. 766-768 ◽  
Author(s):  
D. Tönnies ◽  
G. Bacher ◽  
A. Forchel ◽  
A. Waag ◽  
G. Landwehr

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