Space-charge anomalies in insulators caused by non-local impact ionisation

1989 ◽  
Vol 1 (39) ◽  
pp. 7021-7031 ◽  
Author(s):  
B K Ridley ◽  
F A El-Ela
2019 ◽  
Vol 21 (5) ◽  
pp. 053009 ◽  
Author(s):  
Julius Strake ◽  
Franz Kaiser ◽  
Farnaz Basiri ◽  
Henrik Ronellenfitsch ◽  
Dirk Witthaut

Author(s):  
M. J. van Dort ◽  
J. W. Slotboom ◽  
G. Streutker ◽  
P. H. Woerlee

2002 ◽  
Vol 29 (7) ◽  
pp. 739-752 ◽  
Author(s):  
Eduard Amromin ◽  
Svetlana Kovinskaya ◽  
Valentin Sofronov
Keyword(s):  

VLSI Design ◽  
1998 ◽  
Vol 6 (1-4) ◽  
pp. 291-297 ◽  
Author(s):  
Duilio Meglio ◽  
Corrado Cianci ◽  
Aldo Di Carlo ◽  
Paolo Lugli

Impact ionization processes define the breakdown characteristics of semiconductor devices. An accurate description of such phenomenon, however, is limited to very sophisticated device simulators such as Monte Carlo. A new physical model for the impact ionization process is presented, which accounts for dead space effects and high energy carrier transport at a Drift Diffusion level. Such model allows to define universal impact ionization coefficients which are device-geometry independent. By using available experimental data these parameters have been calculated for In0.53Ga0.47As.


Sign in / Sign up

Export Citation Format

Share Document