Extreme-ultraviolet multilayer mirrors deposited using radio-frequency-magnetron sputtering: the influence of self-bias voltage on reflectivity and roughness

Multilayer Mirrors ◽

Self Bias

Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering

Applied Optics ◽

10.1364/ao.33.002057 ◽

1994 ◽

Vol 33 (10) ◽

pp. 2057 ◽

Cited By ~ 24

Author(s):

Claude Montcalm ◽

Brian T. Sullivan ◽

Henri Pépin ◽

J. A. Dobrowolski ◽

M. Sutton

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Extreme Ultraviolet ◽

Multilayer Mirrors

Influence of substrate direct current bias voltage on microcrystalline silicon growth during radio-frequency magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2007.11.004 ◽

2008 ◽

Vol 82 (8) ◽

pp. 777-781 ◽

Cited By ~ 4

Author(s):

A. Tabata ◽

K. Fukaya ◽

T. Mizutani

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Direct Current ◽

Microcrystalline Silicon ◽

Direct Current Bias ◽

Silicon Growth ◽

Influence Of Substrate

Influence of substrate bias voltage on the properties of TiO 2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications

Applied Surface Science ◽

10.1016/j.apsusc.2016.07.101 ◽

2017 ◽

Vol 395 ◽

pp. 72-77 ◽

Cited By ~ 21

Author(s):

L. Bait ◽

L. Azzouz ◽

N. Madaoui ◽

N. Saoula

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Influence Of Substrate

Effect of Substrate Bias Voltage on the Properties of Hafnium Nitride Films Deposited by Radio Frequency Magnetron Sputtering Assisted by Inductive Coupled Nitrogen Plasma

Transactions on Electrical and Electronic Materials ◽

10.4313/teem.2011.12.5.209 ◽

2011 ◽

Vol 12 (5) ◽

pp. 209-212 ◽

Cited By ~ 1

Author(s):

Sung-Bo Heo ◽

Hak-Min Lee ◽

Dae-Il Kim ◽

Dae-Han Choi ◽

Byung-Hoon Lee ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Nitrogen Plasma ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Hafnium Nitride

Enhancement of electrical properties in Al-doped ZnO films by tuning dc bias voltage during radio frequency magnetron sputtering

Current Applied Physics ◽

10.1016/j.cap.2012.05.022 ◽

2012 ◽

Vol 12 ◽

pp. S71-S75 ◽

Cited By ~ 4

Author(s):

Y.S. No ◽

D.H. Park ◽

T.W. Kim ◽

J.W. Choi ◽

B. Angadi ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Zno Films ◽

Dc Bias ◽

Doped Zno

Effect of Plused Negative Bias on Nucleation and Morphological Evolution of ZnO Films Deposited by Reactive Radio-frequency Magnetron Sputtering

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2009.00602 ◽

2009 ◽

Vol 24 (3) ◽

pp. 602-606 ◽

Cited By ~ 1

Author(s):

Wei-Jia FU ◽

Zhi-Wen LIU ◽

Jian-Feng GU ◽

Ming LIU ◽

Qing-Yu ZHANG

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Morphological Evolution ◽

Radio Frequency Magnetron Sputtering

Zno Films ◽

Negative Bias ◽

Effect of sputtering power on the properties of SiO2 films grown by radio frequency magnetron sputtering at room temperature

Optical and Quantum Electronics ◽

10.1007/s11082-020-02639-4 ◽

2021 ◽

Vol 53 (1) ◽

Author(s):

Changjiang Zhao ◽

Leran Zhao ◽

Juncheng Liu ◽

Zhigang Liu ◽

Yan Chen

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Room Temperature ◽

Sio2 Films ◽

Sputtering Power

Mechanical, tribological, anti-corrosion and anti-glass sticking properties of high-entropy TaNbSiZrCr carbide coatings prepared using radio-frequency magnetron sputtering

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2021.124741 ◽

2021 ◽

pp. 124741

Author(s):

W.H. Kao ◽

Y.L. Su ◽

J.H. Horng ◽

W.C. Wu

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

High Entropy ◽

Carbide Coatings

Nickel telluride vertically aligned thin film by radio-frequency magnetron sputtering for hydrogen evolution reaction

APL Materials ◽

10.1063/5.0024588 ◽

2020 ◽

Vol 8 (12) ◽

pp. 121104

Author(s):

Jeonghyeon Oh ◽

Ho Jun Park ◽

Arindam Bala ◽

Hee-Soo Kim ◽

Na Liu ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Hydrogen Evolution ◽

Hydrogen Evolution Reaction ◽

Vertically Aligned

Study of silicon quantum dots structure growth using radio frequency magnetron sputtering

2010 International Conference on Enabling Science and Nanotechnology (ESciNano) ◽

10.1109/escinano.2010.5701070 ◽

2010 ◽

Author(s):

Samsudi Sakrani ◽

Fatima Aldaw Idrees ◽

Zulkafli Othaman ◽

Abd. Khamim Ismail

Keyword(s):

Quantum Dots ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Silicon Quantum Dots