Influence of substrate direct current bias voltage on microcrystalline silicon growth during radio-frequency magnetron sputtering

Microcrystalline Silicon ◽

Direct Current Bias ◽

Silicon Growth ◽

Influence Of Substrate

Influence of substrate bias voltage on the properties of TiO 2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications

Applied Surface Science ◽

10.1016/j.apsusc.2016.07.101 ◽

2017 ◽

Vol 395 ◽

pp. 72-77 ◽

Cited By ~ 21

Author(s):

L. Bait ◽

L. Azzouz ◽

N. Madaoui ◽

N. Saoula

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Influence Of Substrate

Mechanism of Growth of Cr$_{2}$O$_{3}$ Thin Films on ($1\bar{1}02$), ($11\bar{2}0$), and (0001) Surfaces of Sapphire Substrates by Direct Current–Radio Frequency Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.11pg12 ◽

2012 ◽

Vol 51 ◽

pp. 11PG12 ◽

Cited By ~ 1

Author(s):

Nobuyuki Iwata ◽

Takuji Kuroda ◽

Hiroshi Yamamoto

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Sapphire Substrates ◽

Mechanism Of Growth

Influence of substrate bias on the structure and properties of TiCN films deposited by radio-frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2016.08.047 ◽

2016 ◽

Vol 616 ◽

pp. 521-529 ◽

Cited By ~ 19

Author(s):

N. Saoula ◽

N. Madaoui ◽

R. Tadjine ◽

R.M. Erasmus ◽

S. Shrivastava ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Substrate Bias ◽

Structure And Properties ◽

Influence Of Substrate

Structural and electrochemical properties of LiNi0.7Co0.15Mn0.15O2 thin film prepared by high frequency hybrid direct current and radio frequency magnetron sputtering

Journal of Electroceramics ◽

10.1007/s10832-013-9845-5 ◽

2013 ◽

Vol 31 (3-4) ◽

pp. 316-323 ◽

Cited By ~ 3

Author(s):

Youngmin Chung ◽

Ho-young Park ◽

Si-hyoung Oh ◽

Dong Young Yoon ◽

Sang-wan Jin ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Electrochemical Properties ◽

Direct Current ◽

High Frequency ◽

Radio Frequency Magnetron Sputtering

Stereometric analysis of Ti 1− x Al x N thin films deposited by direct current/radio frequency magnetron sputtering

Microscopy Research and Technique ◽

10.1002/jemt.23905 ◽

2021 ◽

Author(s):

Robert Saraiva Matos ◽

Henrique Duarte Fonseca Filho ◽

Abhijeet Das ◽

Sanjeev Kumar ◽

Vipin Chawla ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Radio Frequency Magnetron Sputtering

Extreme-ultraviolet multilayer mirrors deposited using radio-frequency-magnetron sputtering: the influence of self-bias voltage on reflectivity and roughness

Journal of Physics Condensed Matter ◽

10.1088/0953-8984/13/18/307 ◽

2001 ◽

Vol 13 (18) ◽

pp. 3969-3976 ◽

Cited By ~ 5

Author(s):

M Putero-Vuaroqueaux ◽

B Vidal

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Extreme Ultraviolet ◽

Multilayer Mirrors ◽

Self Bias

Mechanical, tribological and corrosion properties of CrBN films deposited by combined direct current and radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2013.02.103 ◽

2013 ◽

Vol 544 ◽

pp. 335-340 ◽

Cited By ~ 17

Author(s):

Vera Jahodova ◽

Xing-zhao Ding ◽

Debbie H.L. Seng ◽

W. Gulbinski ◽

P. Louda

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Corrosion Properties

Influence of target direct current bias voltage on the film structure of hydrogenated microcrystalline silicon prepared by direct current–radiofrequency coupled magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2004.10.044 ◽

2005 ◽

Vol 478 (1-2) ◽

pp. 132-136 ◽

Cited By ~ 10

Author(s):

K. Fukaya ◽

A. Tabata ◽

T. Mizutani

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

Direct Current ◽

Film Structure ◽

Microcrystalline Silicon ◽

Direct Current Bias

A comparison of SiO2 planarization layers by hollow cathode enhanced direct current reactive magnetron sputtering and radio frequency magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576914 ◽

1990 ◽

Vol 8 (3) ◽

pp. 1294-1298 ◽

Cited By ~ 4

Author(s):

David F. Dawson‐Elli ◽

Anthony R. Lefkow ◽

James E. Nordman

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Hollow Cathode ◽

Radio Frequency Magnetron Sputtering

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Mechanism of Growth of Cr2O3Thin Films on (11̄02), (112̄0), and (0001) Surfaces of Sapphire Substrates by Direct Current–Radio Frequency Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.11pg12 ◽

2012 ◽

Vol 51 (11S) ◽

pp. 11PG12 ◽

Cited By ~ 9

Author(s):

Nobuyuki Iwata ◽

Takuji Kuroda ◽

Hiroshi Yamamoto

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Sapphire Substrates ◽

Mechanism Of Growth