Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering

ZrCuAlNi thin film metallic glass grown by high power impulse and direct current magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2021.127029 ◽

2021 ◽

pp. 127029

Author(s):

Niklas Bönninghoff ◽

Wahyu Diyatmika ◽

Jinn P. Chu ◽

Stanislav Mráz ◽

Jochen M. Schneider ◽

...

Keyword(s):

Thin Film ◽

Metallic Glass ◽

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽

Low resistivity Ru1-xTixO2 thin films deposited by hybrid high-power impulse magnetron sputtering and direct current magnetron sputtering technique

Thin Solid Films ◽

10.1016/j.tsf.2019.03.005 ◽

2019 ◽

Vol 676 ◽

pp. 54-59 ◽

Cited By ~ 1

Author(s):

C.S. Sandu ◽

A. Magrez ◽

A. Karimi ◽

R. Sanjinés

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽

Low Resistivity ◽

Ion mass spectrometry investigations of the discharge during reactive high power pulsed and direct current magnetron sputtering of carbon in Ar and Ar/N2

Journal of Applied Physics ◽

10.1063/1.4733692 ◽

2012 ◽

Vol 112 (1) ◽

pp. 013305 ◽

Cited By ~ 25

Author(s):

S. Schmidt ◽

Zs. Czigány ◽

G. Greczynski ◽

J. Jensen ◽

L. Hultman

Keyword(s):

Mass Spectrometry ◽

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽

Ion Mass Spectrometry

Reactive sputtering of δ-ZrH2 thin films by high power impulse magnetron sputtering and direct current magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4882859 ◽

2014 ◽

Vol 32 (4) ◽

pp. 041510 ◽

Cited By ~ 7

Author(s):

Hans Högberg ◽

Lina Tengdelius ◽

Mattias Samuelsson ◽

Fredrik Eriksson ◽

Esteban Broitman ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽

Reactive Sputtering ◽

Structure and tribological behavior of (AlCrNbSiTiV)N film deposited using direct current magnetron sputtering and high power impulse magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2018.10.023 ◽

2018 ◽

Vol 668 ◽

pp. 63-68 ◽

Cited By ~ 5

Author(s):

Chun-Hao Chang ◽

Ching-Been Yang ◽

Chia-Chi Sung ◽

Chun-Yao Hsu

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽

Tribological Behavior ◽

Optical properties of diamond like carbon films containing copper, grown by high power pulsed magnetron sputtering and direct current magnetron sputtering: Structure and composition effects

Thin Solid Films ◽

10.1016/j.tsf.2014.11.045 ◽

2015 ◽

Vol 581 ◽

pp. 48-53 ◽

Cited By ~ 18

Author(s):

Š. Meškinis ◽

A. Čiegis ◽

A. Vasiliauskas ◽

K. Šlapikas ◽

T. Tamulevičius ◽

...

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽

Carbon Films ◽

Diamond Like Carbon ◽

Composition Effects ◽

Pulsed Magnetron

Technical Note:Corrosion Behavior of Post-Deposition Polished Droplet-Embedded Arc Evaporated and Droplet-Free High Power Impulse Magnetron Sputtering/Direct Current Magnetron Sputtering Coatings

CORROSION ◽

10.5006/2064 ◽

2017 ◽

Vol 73 (6) ◽

pp. 685-693 ◽

Cited By ~ 3

Author(s):

Arunprabhu Arunachalam Sugumaran ◽

Yashodhan Purandare ◽

Arutiun Papken Ehiasarian ◽

Papken Ehiasarian Hovsepian

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽

Post Deposition

Comparison of microstructures and magnetic properties in FePt alloy films deposited by direct current magnetron sputtering and high power impulse magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2019.06.216 ◽

2019 ◽

Vol 803 ◽

pp. 341-347 ◽

Cited By ~ 3

Author(s):

Wen-Sheng Yang ◽

Ta-Huang Sun ◽

Sheng-Chi Chen ◽

Shien-Uang Jen ◽

Han-Jie Guo ◽

...

Keyword(s):

Magnetic Properties ◽

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽

Alloy Films ◽

Fept Alloy ◽

Cathode Current Density Distributions in High Power Impulse and Direct Current Magnetron Sputtering Modes

Plasma Processes and Polymers ◽

10.1002/ppap.200931201 ◽

2009 ◽

Vol 6 (S1) ◽

pp. S548-S553 ◽

Cited By ~ 15

Author(s):

Gregory Clarke ◽

Anurag Mishra ◽

Peter J. Kelly ◽

James W. Bradley

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Current Density ◽

High Power ◽

Cathode Current Density ◽

Density Distributions ◽

Cathode Current

β-Ta and α-Cr thin films deposited by high power impulse magnetron sputtering and direct current magnetron sputtering in hydrogen containing plasmas

Physica B Condensed Matter ◽

10.1016/j.physb.2013.11.038 ◽

2014 ◽

Vol 439 ◽

pp. 3-8 ◽

Cited By ~ 8

Author(s):

Hans Högberg ◽

Lina Tengdelius ◽

Mattias Samuelsson ◽

Jens Jensen ◽

Lars Hultman

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽