Calculation of discharge parameters in low-pressure diode-type radio frequency noble gas plasmas

In this study, the characteristic properties and plasma parameters of capacitive radio frequency (RF) argon (Ar) discharge and supplementary discharge at low pressure are investigated with optical emission spectroscopy (OES). The wavelengths of spectral lines from OES are obtained between 650–900 nm. Using OES lines and related experimental data, the electron temperatures for different RF power, flow, and measurement periods are determined. Eventually, the properties of plasma including the electron temperature are identified. In addition, the numerical modelling of the discharge parameters is carried out by using the “extended” fluid model for plasma, and consistency between numerical and experimental results is discussed.

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Power dissipated in low‐pressure radio‐frequency discharge plasmas

Journal of Applied Physics ◽

10.1063/1.335395 ◽

1985 ◽

Vol 57 (1) ◽

pp. 53-58 ◽

Cited By ~ 103

Author(s):

O. A. Popov ◽

V. A. Godyak

Keyword(s):

Radio Frequency ◽

Low Pressure ◽

Discharge Plasmas ◽

Radio Frequency Discharge

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Radio-frequency magnetized ring-shaped hollow cathode discharge plasma for low-pressure plasma processing

Vacuum ◽

10.1016/j.vacuum.2013.07.029 ◽

2014 ◽

Vol 101 ◽

pp. 46-52 ◽

Cited By ~ 7

Author(s):

Yasunori Ohtsu ◽

Junta Eguchi ◽

Yoshiki Yahata

Keyword(s):

Radio Frequency ◽

Hollow Cathode ◽

Discharge Plasma ◽

Plasma Processing ◽

Low Pressure ◽

Hollow Cathode Discharge ◽

Pressure Plasma ◽

Low Pressure Plasma

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Summary Abstract: Diagnostics of low‐pressure oxygen radio‐frequency plasmas and the mechanism for polymer etching: A comparison of reactive sputter etching and magnetron sputter etching

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.573942 ◽

1986 ◽

Vol 4 (3) ◽

pp. 1798-1799 ◽

Cited By ~ 1

Author(s):

Ch. Steinbrüchel ◽

B. J. Curtis ◽

H. W. Lehmann ◽

R. Widmer

Keyword(s):

Radio Frequency ◽

Low Pressure ◽

Pressure Oxygen ◽

Magnetron Sputter ◽

Sputter Etching

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Stability of a dust cloud in the radio frequency low-pressure gas discharge

Physics of Plasmas ◽

10.1063/5.0053178 ◽

2021 ◽

Vol 28 (7) ◽

pp. 073701

Author(s):

D. I. Zhukhovitskii

Keyword(s):

Radio Frequency ◽

Dust Cloud ◽

Low Pressure ◽

Gas Discharge

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Computations of Low Pressure Fluid Flow and Heat Transfer in Ducts Using Direct Simulation Monte Carlo Method

10.1115/imece1999-1063 ◽

1999 ◽

Author(s):

Fang Yan ◽

Bakhtier Farouk

Keyword(s):

Heat Transfer ◽

Monte Carlo ◽

Noble Gas ◽

Direct Simulation Monte Carlo ◽

Low Pressure ◽

Direct Simulation ◽

Flow And Heat Transfer ◽

Gas Transport Properties ◽

Pressure Profiles ◽

Simulation Monte Carlo

Abstract High Knudsen (Kn) number flows are found in vacuum and micro-scale systems. Such flows are characterized by non-continuum behavior. For gases, the flows are usually in the slip or transition regimes. In this paper, the direct simulation Monte Carlo (DSMC) method has been applied to compute low pressure, high Kn flow fields in partially heated channels. Computations were carried out for nitrogen, argon, hydrogen, oxygen and noble gas mixtures. Variation of the Kn is obtained by reducing the pressure while keeping the channel width constant. Nonlinear pressure profiles along the channel centerline are observed. Heat transfer from the channel walls is also calculated and compared with the Graetz solution. The effects of varying pressure, inlet flow and gas transport properties (Kn, Reynolds number, Re and the Prandtl number, Pr respectively) on the wall heat transfer (Nu) were examined. A simplified correlation for predicting Nu¯ as a function of Pe¯ and Kn¯ is presented.

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