Room Temperature Growth of Hydrogenated Amorphous Silicon Films by Dielectric Barrier Discharge Enhanced CVD

2007 ◽  
Vol 9 (2) ◽  
pp. 177-180 ◽  
Author(s):  
Guo Yu ◽  
Zhang Xiwen ◽  
Han Gaorong
1996 ◽  
Vol 35 (Part 2, No. 8A) ◽  
pp. L1009-L1011 ◽  
Author(s):  
Masashi Goto ◽  
Hirotaka Toyoda ◽  
Masatoshi Kitagawa ◽  
Takashi Hirao ◽  
Hideo Sugai

1998 ◽  
Vol 227-230 ◽  
pp. 1164-1167 ◽  
Author(s):  
Oleg Gusev ◽  
Mikhail Bresler ◽  
Alexey Kuznetsov ◽  
Vera Kudoyarova ◽  
Petr Pak ◽  
...  

1992 ◽  
Vol 258 ◽  
Author(s):  
J. Fan ◽  
J. Kakalios

ABSTRACTThe room temperature non-radiative efficiency, defined as the ratio of the heat released per absorbed photon for doped and undoped hydrogenated amorphous silicon (a-Si:H) has been measured using photo-pyroelectric spectroscopy (PPES) for photon energies ranging from 2.5 to 1.6 eV. There is a fairly sharp minimum in the non-radiative efficiency when the a-Si:H is illuminated with near bandgap photons. We describe a model wherein this minimum arises from the variation in the amount of heat generated by free carrier thermalization as the incident photon energy is varied, and report measurements of the excitation kinetics of the non-radiative efficiency which support this proposal.


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