Studies on transient characteristics of unipolar resistive switching processes in TiO2thin film grown by atomic layer deposition
2018 ◽
Vol 51
(21)
◽
pp. 215101
◽
2017 ◽
Vol 56
(5)
◽
pp. 050304
◽
2020 ◽
Vol 38
(3)
◽
pp. 032405
Keyword(s):
Improvement of Resistive Switching Stability of HfO2 Films with Al Doping by Atomic Layer Deposition
2012 ◽
Vol 15
(4)
◽
pp. H88
◽
Keyword(s):