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Controllability of structural and electrical properties of silicon films grown in atmospheric-pressure very high-frequency plasma
Journal of Physics D Applied Physics
◽
10.1088/1361-6463/aad47c
◽
2018
◽
Vol 51
(35)
◽
pp. 355203
◽
Cited By ~ 2
Author(s):
Hiroaki Kakiuchi
◽
Hiromasa Ohmi
◽
Kiyoshi Yasutake
Keyword(s):
Electrical Properties
◽
Atmospheric Pressure
◽
High Frequency
◽
Silicon Films
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Structural And Electrical Properties
◽
Very High
Download Full-text
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References
Characterization of High-Rate Deposited Microcrystalline Si Films Prepared Using Atmospheric-Pressure Very High Frequency Plasma
ECS Meeting Abstracts
◽
10.1149/ma2009-02/34/2510
◽
2009
◽
Keyword(s):
Atmospheric Pressure
◽
High Frequency
◽
High Rate
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
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◽
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High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells using Very High Frequency Plasma at Atmospheric Pressure
10.7567/ssdm.2005.p8-4
◽
2005
◽
Author(s):
Hiroaki Kakiuchi
◽
Hiromasa Ohmi
◽
Yasuhito Kuwahara
◽
Mitsuhiro Matsumoto
◽
Yusuke Ebata
◽
...
Keyword(s):
Solar Cells
◽
Amorphous Silicon
◽
Atmospheric Pressure
◽
High Frequency
◽
High Rate
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Very High
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Highly efficient formation process for functional silicon oxide layers at low temperatures (≤ 120 °C) using very high-frequency plasma under atmospheric pressure
Precision Engineering
◽
10.1016/j.precisioneng.2019.07.017
◽
2019
◽
Vol 60
◽
pp. 265-273
Author(s):
Hiroaki Kakiuchi
◽
Hiromasa Ohmi
◽
Kiyoshi Yasutake
Keyword(s):
Formation Process
◽
Atmospheric Pressure
◽
High Frequency
◽
Low Temperatures
◽
Silicon Oxide
◽
Very High Frequency
◽
Oxide Layers
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Very High
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Characterization of High-Rate Deposited Microcrystalline Si Films Prepared using Atmospheric-Pressure Very High-Frequency Plasma
ECS Transactions
◽
10.1149/1.3207619
◽
2019
◽
Vol 25
(8)
◽
pp. 405-412
Author(s):
Keita Tabuchi
◽
Kentato Ouchi
◽
Hiromasa Ohmi
◽
Hiroaki Kakiuchi
◽
Kiyoshi Yasutake
Keyword(s):
Atmospheric Pressure
◽
High Frequency
◽
High Rate
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Si Films
◽
Very High
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Crystallinity of silicon films grown on carbon fibers by very high frequency plasma enhanced chemical vapor deposition
Thin Solid Films
◽
10.1016/j.tsf.2015.08.029
◽
2015
◽
Vol 591
◽
pp. 137-142
◽
Cited By ~ 2
Author(s):
Eulyong Chae
◽
Kyumin Lee
◽
Hwan Lee
◽
Daehong Ko
◽
Hongsik Jeong
◽
...
Keyword(s):
Chemical Vapor Deposition
◽
Carbon Fibers
◽
Vapor Deposition
◽
High Frequency
◽
Chemical Vapor
◽
Silicon Films
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Very High
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High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells Using Very High Frequency Plasma at Atmospheric Pressure
Japanese Journal of Applied Physics
◽
10.1143/jjap.45.3587
◽
2006
◽
Vol 45
(4B)
◽
pp. 3587-3591
◽
Cited By ~ 15
Author(s):
Hiroaki Kakiuchi
◽
Hiromasa Ohmi
◽
Yasuhito Kuwahara
◽
Mitsuhiro Matsumoto
◽
Yusuke Ebata
◽
...
Keyword(s):
Solar Cells
◽
Amorphous Silicon
◽
Atmospheric Pressure
◽
High Frequency
◽
High Rate
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Very High
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Room-Temperature Silicon Nitrides Prepared with Very High Rates (>50 nm/s) in Atmospheric-Pressure Very High-Frequency Plasma
Plasma Chemistry and Plasma Processing
◽
10.1007/s11090-010-9242-7
◽
2010
◽
Vol 30
(5)
◽
pp. 579-590
◽
Cited By ~ 6
Author(s):
Hiroaki Kakiuchi
◽
Hiromasa Ohmi
◽
Kei Nakamura
◽
Yoshihito Yamaguchi
◽
Kiyoshi Yasutake
Keyword(s):
Atmospheric Pressure
◽
High Frequency
◽
Room Temperature
◽
Silicon Nitrides
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Very High
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Heteroepitaxial growth of cubic SiC on Si using very-high-frequency plasma at atmospheric pressure
Surface and Interface Analysis
◽
10.1002/sia.2814
◽
2008
◽
Vol 40
(6-7)
◽
pp. 974-978
◽
Cited By ~ 2
Author(s):
Hiroaki Kakiuchi
◽
Hiromasa Ohmi
◽
Masatoshi Aketa
◽
Ryota Nakamura
◽
Kiyoshi Yasutake
Keyword(s):
Atmospheric Pressure
◽
High Frequency
◽
Heteroepitaxial Growth
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Very High
Download Full-text
Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma
Thin Solid Films
◽
10.1016/j.tsf.2010.08.003
◽
2010
◽
Vol 519
(1)
◽
pp. 235-239
◽
Cited By ~ 13
Author(s):
H. Kakiuchi
◽
H. Ohmi
◽
Y. Yamaguchi
◽
K. Nakamura
◽
K. Yasutake
Keyword(s):
Atmospheric Pressure
◽
High Frequency
◽
Room Temperature
◽
Silicon Oxide
◽
Oxide Coatings
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Very High
◽
Low Refractive Index
Download Full-text
Characterization of hydrogenated amorphous Si1 xCxfilms prepared at extremely high rates using very high frequency plasma at atmospheric pressure
Journal of Physics D Applied Physics
◽
10.1088/0022-3727/36/23/029
◽
2003
◽
Vol 36
(23)
◽
pp. 3057-3063
◽
Cited By ~ 11
Author(s):
Y Mori
◽
H Kakiuchi
◽
K Yoshii
◽
K Yasutake
◽
H Ohmi
Keyword(s):
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◽
High Frequency
◽
Very High Frequency
◽
High Frequency Plasma
◽
Frequency Plasma
◽
Hydrogenated Amorphous
◽
Very High
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