Negatively charged silicon nitride films for improved p-type silicon surface passivation by low-temperature rapid thermal annealing

2019 ◽  
Vol 52 (34) ◽  
pp. 345102 ◽  
Author(s):  
Peng Wang ◽  
Shangjie Jin ◽  
Tao Lu ◽  
Can Cui ◽  
Deren Yang ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Low Temperature ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Silicon Nitride Films ◽  
Temperature Rapid Thermal Annealing ◽  
P Type ◽  
Silicon Surface Passivation

scholarly journals Correlating the silicon surface passivation to the nanostructure of low-temperature a-Si:H after rapid thermal annealing

2017 ◽  
Vol 122 (3) ◽  
pp. 035302 ◽  
Author(s):  
Bart Macco ◽  
Jimmy Melskens ◽  
Nikolas J. Podraza ◽  
Karsten Arts ◽  
Christopher Pugh ◽  
...  
Keyword(s):  
Low Temperature ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Silicon Surface Passivation

scholarly journals Improved Silicon Surface Passivation of APCVD Al2O3 by Rapid Thermal Annealing

2016 ◽  
Vol 92 ◽  
pp. 317-325 ◽  
Author(s):  
Lachlan E. Black ◽  
Thomas Allen ◽  
Keith R. McIntosh ◽  
Andres Cuévas
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Silicon Surface Passivation

NH3Plasma Interface Modification for Silicon Surface Passivation at Very Low Temperature

2008 ◽  
Vol 47 (7) ◽  
pp. 5320-5323 ◽  
Author(s):  
Yu Takahashi ◽  
Jin Nigo ◽  
Akiyoshi Ogane ◽  
Yukiharu Uraoka ◽  
Takashi Fuyuki
Keyword(s):  
Low Temperature ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Interface Modification ◽  
Silicon Surface Passivation ◽  
Very Low Temperature
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