Atmospheric pulsed laser deposition and thermal annealing of plasmonic silver nanoparticle films

2017 ◽  
Vol 28 (44) ◽  
pp. 445601 ◽  
Author(s):  
T M Khan ◽  
M A Mujawar ◽  
K E Siewerska ◽  
A Pokle ◽  
T Donnelly ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Thermal Annealing ◽  
Silver Nanoparticle ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Nanoparticle Films

Magnetic anisotropy in Ni–Si nanoparticle films produced by ultrashort pulsed laser deposition

2008 ◽  
Vol 320 (20) ◽  
pp. e594-e598 ◽  
Author(s):  
V. Iannotti ◽  
G. Ausanio ◽  
C. Campana ◽  
F. D’Orazio ◽  
C. Hison ◽  
...  
Keyword(s):  
Magnetic Anisotropy ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Nanoparticle Films ◽  
Si Nanoparticle ◽  
Ultrashort Pulsed Laser

SrTiO3 Thin Films Deposition Using Pulsed Laser Deposition Technique

2013 ◽  
Vol 789 ◽  
pp. 72-75
Author(s):  
Pia Dinari ◽  
Christian Chandra ◽  
Joko Suwardy ◽  
Salim Mustofa ◽  
Yudi Darma
Keyword(s):  
Pulsed Laser Deposition ◽  
Thermal Annealing ◽  
Pulsed Laser ◽  
Film Deposition ◽  
Laser Deposition ◽  
Deposition Technique ◽  
X Ray Diffraction ◽  
Si Substrate ◽  
Thermal Annealing Process ◽  
Thermal Stability Of

Strontium titanate (SrTiO3) thin film has been deposited on Si (100) substrate using pulsed laser deposition technique. Film deposition was carried out at low temperature (150°C) by maintained the pressure at 10-4 Torr. Nanometer-thick SrTiO3 film on Si substrate was characterized using SEM, AFM, XRD, and Raman Spectroscopy. SEM and AFM images show that SrTiO3 film has growth on Si substrate uniformly. Raman and XRD spectroscopy also support the growth of SrTiO3 film on Si substrate. Furthermore, to investigate the effect of post-deposition thermal annealing, the samples were annealed up to 900°C. Thermal stability of SrTiO3/Si structure was studied by mean XRD spectra. The X-Ray Diffraction pattern indicates the crystallinity improvement through atomic arrangements during thermal annealing process.

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