scholarly journals The origin of negative charging in amorphous Al2O3 films: the role of native defects

2019 ◽  
Vol 30 (20) ◽  
pp. 205201 ◽  
Author(s):  
Oliver A Dicks ◽  
Jonathon Cottom ◽  
Alexander L Shluger ◽  
Valeri V Afanas’ev
2019 ◽  
Vol 100 (23) ◽  
Author(s):  
Daniel F. Souza ◽  
Andréia L. Rosa ◽  
Pedro Venezuela ◽  
José E. Padilha ◽  
Adalberto Fazzio ◽  
...  

2020 ◽  
Vol 196 ◽  
pp. 626-634
Author(s):  
Jaime Dolado ◽  
Ruth Martínez-Casado ◽  
Pedro Hidalgo ◽  
Rafael Gutierrez ◽  
Arezoo Dianat ◽  
...  

2017 ◽  
Vol 4 (3) ◽  
pp. 036402
Author(s):  
Ijaz Ahmad Khan ◽  
Noureen Amna ◽  
Nosheen Kanwal ◽  
Maleeha Razzaq ◽  
Amjad Farid ◽  
...  

2017 ◽  
Vol 125 ◽  
pp. 27-37 ◽  
Author(s):  
Astrid van der Rest ◽  
Hosni Idrissi ◽  
Frédéric Henry ◽  
Audrey Favache ◽  
Dominique Schryvers ◽  
...  

1993 ◽  
Vol 311 ◽  
Author(s):  
J. Liu ◽  
C. J. Barbero ◽  
J. W. Corbett ◽  
K. Rajan ◽  
H. Leary

ABSTRACTAn in situ study of electron beam irradiation induced amorphous–to–crystalline transformation of Al2O3 films on silicon substrates has been carried out using transmission electron microscopy. Trigonal α–Al2O3 crystallites can be observed for electron beam dose rates larger than 10 mA/cm2. It is found that the nucleation and growth processes dominate near the Al2O3–Si interface. The possible effect of the silicon substrate on the growth of Al2O3 crystallites is considered.


2007 ◽  
Vol 101 (3) ◽  
pp. 033112 ◽  
Author(s):  
Zhisong Xiao ◽  
R. Serna ◽  
C. N. Afonso

2014 ◽  
Vol 16 (46) ◽  
pp. 25314-25320 ◽  
Author(s):  
Khang Hoang ◽  
Anderson Janotti ◽  
Chris G. Van de Walle

We propose an atomistic mechanism for the decomposition of Li4BN3H10 in which the cogeneration of NH3 gas is associated with self-diffusion of negatively charged hydrogen vacancies.


2016 ◽  
Vol 28 (42) ◽  
pp. 425801 ◽  
Author(s):  
Milton A Tumelero ◽  
Ricardo Faccio ◽  
Andre A Pasa

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