scholarly journals Electron-beam deposition of thermoconducting ceramic coatings for microelectronic devices

2021 ◽  
Vol 2064 (1) ◽  
pp. 012072
Author(s):  
E M Oks’ ◽  
A V Tyunkov ◽  
Y G Yushkov ◽  
D B Zolotukhin
Keyword(s):  
Experimental Study ◽  
Electron Beam ◽  
Aluminum Oxide ◽  
Ceramic Coatings ◽  
Electron Beam Evaporation ◽  
Dielectric Parameters ◽  
Dielectric Coatings ◽  
Microelectronic Devices ◽  
Electron Beam Deposition ◽  
Beam Deposition

Abstract This paper presents the experimental study of dielectric coatings based on aluminum oxide (Al2O3) and aluminum nitride (AlN) ceramics as applied to their use in microelectronics. It is shown that the coatings obtained by electron-beam evaporation of ceramic in forevacuum pressures (1-100 Pa) endow devices with required dielectric parameters and improves heat sink from the surface of monolithic integral circuits.

scholarly journals Electron beam deposition of ceramic coatings at fore-vacuum pressure

2016 ◽  
Author(s):  
Andrey Tyunkov ◽  
Yury Yushkov ◽  
Denis Zolotukhin ◽  
Efim Oks
Keyword(s):  
Electron Beam ◽  
Ceramic Coatings ◽  
Vacuum Pressure ◽  
Electron Beam Deposition ◽  
Beam Deposition

scholarly journals Electron-Beam Deposition of Aluminum Nitride and Oxide Ceramic Coatings for Microelectronic Devices

Coatings ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 645
Author(s):  
Yury G. Yushkov ◽  
Efim M. Oks ◽  
Andrey V. Tyunkov ◽  
Alexey Y. Yushenko ◽  
Denis B. Zolotukhin
Keyword(s):  
Electron Beam ◽  
Integrated Circuits ◽  
Aluminum Nitride ◽  
Ceramic Coatings ◽  
Electron Beam Evaporation ◽  
Oxide Ceramic ◽  
Interaction Picture ◽  
Monolithic Microwave Integrated Circuits ◽  
Microelectronic Devices ◽  
Oxide Ceramic Coatings

This work presents the results of the coating deposition by electron-beam evaporation of aluminum nitride and aluminum oxide targets in nitrogen and oxygen atmospheres in the forevacuum range (5–30 Pa). The method we employed is a combination of the electron-beam and plasma methods, since in the mentioned pressure range, the electron beam creates plasma that essentially changes the interaction picture of both the electron beam with the ceramic target and the flux of evaporated material with a substrate. We show a possibility of depositing such coatings on monolithic microwave integrated circuits passivated by Si3N4 dielectric.

Electron-beam deposition of heat-conducting ceramic coatings in the forevacuum pressure range

2020 ◽  
Vol 46 (13) ◽  
pp. 21190-21195
Author(s):  
Yu.G. Yushkov ◽  
E.M. Oks ◽  
A.V. Tyunkov ◽  
D.B. Zolotukhin ◽  
A. Yu. Yushenko ◽  
...  
Keyword(s):  
Electron Beam ◽  
Pressure Range ◽  
Ceramic Coatings ◽  
Heat Conducting ◽  
Electron Beam Deposition ◽  
Beam Deposition

Electron-beam deposition of magneto-dielectric coatings in the forevacuum pressure range

Vacuum ◽  
2021 ◽  
Vol 184 ◽  
pp. 109944
Author(s):  
D.B. Zolotukhin ◽  
A.A. Klimov ◽  
E.M. Oks ◽  
A.V. Tyunkov ◽  
Yu.G. Yushkov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Pressure Range ◽  
Dielectric Coatings ◽  
Electron Beam Deposition ◽  
Beam Deposition

Electron beam deposition of ZrO2ZnO films

1996 ◽  
Vol 290-291 ◽  
pp. 80-83 ◽  
Author(s):  
S.B. Qadri ◽  
E.F. Skelton ◽  
P. Lubitz ◽  
N.V. Nguyen ◽  
H.R. Khan
Keyword(s):  
Electron Beam ◽  
Zno Films ◽  
Electron Beam Deposition ◽  
Beam Deposition
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