Semiconductor core-level to valence-band maximum binding-energy differences: Precise determination by x-ray photoelectron spectroscopy

1983 ◽  
Vol 28 (4) ◽  
pp. 1965-1977 ◽  
Author(s):  
E. A. Kraut ◽  
R. W. Grant ◽  
J. R. Waldrop ◽  
S. P. Kowalczyk
Keyword(s):  
Binding Energy ◽  
Valence Band ◽  
Photoelectron Spectroscopy ◽  
Valence Band Maximum ◽  
Precise Determination ◽  
Core Level ◽  
Band Maximum ◽  
X Ray

Compositionally Dependent Band Offsets In Aln/AlxGa1-xN Heterojunctions Measured By Using X-Ray Photoelectron Spectroscopy

1997 ◽  
Vol 482 ◽  
Author(s):  
R.A. Beach ◽  
E.C. Piquette ◽  
R.W. Grant ◽  
T.C. McGill
Keyword(s):  
Valence Band ◽  
Photoelectron Spectroscopy ◽  
Valence Band Maximum ◽  
Core Level ◽  
Band Offset ◽  
Valence Band Offset ◽  
Band Offsets ◽  
Band Maximum ◽  
X Ray ◽  
Al Content

AbstractAlthough GaN has been extensively studied for applications in both light emitting and high power devices, the AlN/GaN valence band offset remains an area of contention. Values quoted in the literature range from 0.8eV (Martin)[1] to 1.36eV (Waldrop)[2]. This paper details an investigation of the AIN/AlxGa1-xN band offset as a function of alloy composition. We find an AlN/AlxGa1-xN valence band offset that is nearly linear with Al content and an end point offset for AlN/GaN of 1.36 ± 0.1 eV. Samples were grown using radio frequency plasma assisted molecular beam epitaxy and characterized with x-ray photoelectron spectroscopy(XPS). Core-level and valence-band XPS data for AIN (0001) and AlxGa1-xN (0001) samples were analyzed to determine core-level to valence band maximum (VBM) energy differences. In addition, oxygen contamination effects were tracked in an effort to improve accuracy. Energy separations of core levels were obtained from AlN/AlxGa1-xN(0001) heterojunctions. From this and the core-level to valence band maximum separations of the bulk materials, valence band offsets were calculated.

scholarly journals XPS Study of Oxygen Adsorption on (3×3) Reconstructed MBE Grown Gan Surfaces

1999 ◽  
Vol 4 (S1) ◽  
pp. 648-652 ◽  
Author(s):  
R. A. Beach ◽  
E. C. Piquette ◽  
T. C. McGill ◽  
T. J. Watson
Keyword(s):  
Valence Band ◽  
Photoelectron Spectroscopy ◽  
Oxygen Adsorption ◽  
Valence Band Maximum ◽  
Core Level ◽  
Energy Separation ◽  
Metallic Component ◽  
Band Maximum ◽  
Bulk Gan ◽  
Reconstructed Surface

The incorporation of oxygen onto the (3×3) reconstructed surface of GaN(0001) has been studied using X-ray Photoelectron Spectroscopy (XPS). It was found that the (3×3) reconstruction corresponds to a fractional Ga adlayer atop a Ga terminated GaN surface. Our measurements indicate a surface coverage of 1.15 ± 0.2 monolayers of relaxed Ga on the surface. The binding energy separation between the relaxed surface Ga3d core level and bulk Ga3d level was measured to be 1.1 ± 0.1 eV. A metallic component extending from the bulk GaN valence band maximum out to 0 eV was also present in the XPS spectrum. The separation between the bulk valence band maximum and the Fermi level of the metallic component was found to be 2.1 ± 0.1 eV. The relaxation of the surface Ga was found to decrease with oxygen exposure indicating Ga-O bonding, with oxygen adsorption terminating at 1.3 ± 0.2 monolayers. The O1s core level was found to have a FWHM of 2.0 ± 0.1 eV.

scholarly journals Xps Study of Oxygen Adsorption on (3X3) Reconstructed MBE Grown GaN Surfaces

1998 ◽  
Vol 537 ◽  
Author(s):  
R. A. Beach ◽  
E. C. Piquette ◽  
T. C. McGill ◽  
T. J. Watson
Keyword(s):  
Valence Band ◽  
Photoelectron Spectroscopy ◽  
Oxygen Adsorption ◽  
Valence Band Maximum ◽  
Core Level ◽  
Energy Separation ◽  
Metallic Component ◽  
Band Maximum ◽  
Bulk Gan ◽  
Reconstructed Surface

AbstractThe incorporation of oxygen onto the (3x3) reconstructed surface of GaN(0001) has been studied using X-ray Photoelectron Spectroscopy (XPS). It was found that the (3x3) reconstruction corresponds to a fractional Ga adlayer atop a Ga terminated GaN surface. Our measurements indicate a surface coverage of 1.15 ± 0.2 monolayers of relaxed Ga on the surface. The binding energy separation between the relaxed surface Ga3d core level and bulk Ga3d level was measured to be 1.1 ± 0.1 eV. A metallic component extending from the bulk GaN valence band maximum out to 0 eV was also present in the XPS spectrum. The separation between the bulk valence band maximum and the Fermi level of the metallic component was found to be 2.1 ± 0. 1 eV. The relaxation of the surface Ga was found to decrease with oxygen exposure indicating Ga-O bonding, with oxygen adsorption terminating at 1.3 ± 0.2 monolayers. The Ols core level was found to have a FWHM of 2.0 ± 0.1 eV.

scholarly journals Effect of electron correlation in the decomposition of core level binding energy shifts into initial and final state contributions

2019 ◽  
Vol 21 (18) ◽  
pp. 9399-9406 ◽  
Author(s):  
Marc Figueras ◽  
Carmen Sousa ◽  
Francesc Illas
Keyword(s):  
Binding Energy ◽  
Electron Correlation ◽  
Photoelectron Spectroscopy ◽  
Core Level ◽  
Final State ◽  
X Ray ◽  
Core Level Binding Energy

The influence of electron correlation into the decomposition of core level binding energy shifts, measured by X-ray photoelectron spectroscopy (XPS), into initial and final effects is analysed for a series of molecules where these effects are noticeable.

X-Ray Photoelectron Spectroscopic Studies of Palladium Dispersed on Carbon Surfaces Modified by Ion Beams and Plasmatic Oxidation

1995 ◽  
Vol 60 (3) ◽  
pp. 383-392 ◽  
Author(s):  
Zdeněk Bastl
Keyword(s):  
Binding Energy ◽  
Photoelectron Spectroscopy ◽  
Surface Coverage ◽  
Spectroscopic Studies ◽  
Core Level ◽  
Graphite Surface ◽  
Photoelectron Spectra ◽  
Surface Layers ◽  
X Ray ◽  
Core Level Binding Energy

The effects of ion bombardment and r.f. plasma oxidation of graphite surfaces on subsequent growth and electronic properties of vacuum deposited palladium clusters have been investigated by methods of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy with X-ray excitation (XAES). Due to the significantly increased density of surface defects on which the nucleation process occurs the bulk value of the Pd 3d core level binding energy is achieved at higher surface coverage by palladium on bombarded surfaces than on ordered graphite. Angle resolved photoelectron spectra of oxidized graphite surfaces reveal significant embedding of oxygen in graphite surface layers. The C 1s and O 1s photoelectron spectra are consistent with presence of two major oxygen species involving C-O and C=O type linkages which are not homogeneously distributed within the graphite surface layers. Two effects were observed on oxidized surfaces: an increase of palladium dispersion and interaction of the metal clusters with surface oxygen groups. Using the simple interpretation of the modified Auger parameter the relaxation and chemical shift contributions to the measured Pd core level shifts are estimated. In the region of low surface coverage by palladium the effect of palladium-oxygen interaction on Pd core level binding energy exceeds the effects of increased dispersity.

X-RAY PHOTOELECTRON STUDY OF Bi2Sr2CaCu2-xCoxO~8

1999 ◽  
Vol 13 (13) ◽  
pp. 1655-1662
Author(s):  
N. K. MAN ◽  
KAMLESH KUMARI ◽  
S. VENKATESH ◽  
T. D. HIEN ◽  
N. K. SINH ◽  
...  
Keyword(s):  
Binding Energy ◽  
Photoelectron Spectroscopy ◽  
Hole Concentration ◽  
Core Level ◽  
Spectroscopy Study ◽  
Cobalt Doping ◽  
X Ray ◽  
Co Concentration ◽  
Photoelectron Study

An X-ray photoelectron spectroscopy study has been performed on well characterized Bi 2 Sr 2 CaCu 2-x Co x O ~8 (x=0, 0.02 and 0.1) samples. There is a shift in the Sr binding energy with Co concentration, which is related to the change in T c . This relationship can be understood by the change of hole concentration in the CuO 2 planes as a result of Cobalt doping. The results of Bi 4f and Co 2p core level spectra are also discussed in detail.

Impurities in SiO2: Atomic States of Phosphorus and Arsenic

1986 ◽  
Vol 82 ◽  
Author(s):  
H. E. Rhodes ◽  
G. Apai
Keyword(s):  
Binding Energy ◽  
Silicon Dioxide ◽  
Photoelectron Spectroscopy ◽  
Binding Energies ◽  
Core Level ◽  
X Ray ◽  
Impurity Atoms ◽  
Atomic States ◽  
Energy Signal ◽  
State 1

ABSTRACTWe have studied the atomic states of arsenic (As) and phosphorus (P) in SiO2 using X-ray photoelectron spectroscopy (XPS). Silicon dioxide implanted with As or P shows multiple XPS core level peaks corresponding to the impurity atoms located in two distinct atomic sites. The binding energies of the two arsenic 3d core levels occur at 45.8 and 42.3 eV and the two phosphorus 2p core levels occur at 134.7 and 130.3 eV. When the implanted oxides are annealed in an oxygen ambient between 900°C and 950°C, only the highbinding- energy peaks of P and As are observed. This identifies the highbinding- energy core level peaks as being associated with the impurity (P or As) on silicon sites. Annealing in nitrogen at 950° C results in an increase in the low-binding-energy signal. The low-binding-energy peaks are associated with the impurity (P or As) bonded to silicon neighbors. The relative amounts of dopants in silicon and oxygen sites depend on ambient purity and processing details. Reference to previous work shows that the presence of As or P on silicon sites in SiO2 corresponds to a fast diffusing state whereas As or P on oxygen sites corresponds to a slow diffusing state [1].

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