Experimental and theoretical study of the evolution of surface roughness in amorphous silicon films grown by low-temperature plasma-enhanced chemical vapor deposition

2009 ◽  
Vol 80 (8) ◽  
Author(s):  
Y. A. Kryukov ◽  
N. J. Podraza ◽  
R. W. Collins ◽  
J. G. Amar
Keyword(s):  
Surface Roughness ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Amorphous Silicon ◽  
Vapor Deposition ◽  
Theoretical Study ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Low-Temperature Plasma-Enahanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane

2001 ◽  
Vol 40 (Part 1, No. 1) ◽  
pp. 44-48 ◽  
Author(s):  
Haiping Liu ◽  
Sughoan Jung ◽  
Yukihiro Fujimura ◽  
Chisato Fukai ◽  
Hajime Shirai ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Silicon Film ◽  
Chemical Vapor ◽  
Low Temperature Plasma ◽  
Crystal Silicon ◽  
Temperature Plasma
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