scholarly journals New interference effects from light gauge bosons in neutrino-electron scattering

2021 ◽  
Vol 104 (7) ◽  
Author(s):  
P. S. Bhupal Dev ◽  
Doojin Kim ◽  
Kuver Sinha ◽  
Yongchao Zhang
2020 ◽  
Vol 101 (7) ◽  
Author(s):  
O. G. Miranda ◽  
D. K. Papoulias ◽  
M. Tórtola ◽  
J. W. F. Valle

The work about to be described is a continuation of an investigation begun by one of us at Princeton, New Jersey, on the scattering of electrons by gas atoms. The conditions there were so chosen that only single collisions were taken into account, and it was possible to investigate not only the energy loss on collision, as in the Franck and Hertz experiments, but also the direction of the path of the electron after collision. By employing a magnetic analysis of the velocity of the electron after impact it was found possible to obtain information as to the probability of excitation of various stationary states of the atom considered, on collision with electrons of much higher velocities than could previously be used. The curves relating scattered intensity with angle of scattering were found to have sharp maxima, which were strongly suggestive of diffraction maxima, as might be expected if the motion of electrons is governed by the wave mechanics. But whereas the wave mechanics has been eminently successful in explaining the scattering results of Davisson and Germer with single metal crystals, and of Thomson and Rupp with thin metal foils the results of Dymond have been inexplicable on this basis. It may be said at once that we have been unable to find any trace of the sharp maxima found by him in I, which were apparently due to a secondary cause. Indeed, as has recently been pointed out by Elsasser, no interference effects can be expected, when the electron loses energy on collision, the case in which Dymond found maxima, for the frequencies of the electron before and after interaction with the atom are different and there can consequently be no coherence of the scattered waves.


2000 ◽  
Vol 15 (16) ◽  
pp. 2455-2460
Author(s):  
PAUL H. FRAMPTON

Theoretical background for bileptonic gauge bosons is reviewed — both the SU(15) GUT model and the 3-3-1 model. Mass limits on bileptons are discussed coming from e+e- scattering, polarized muon decay and muonium–antimuonium conversion. Discovery in e-e- at a linear collider at low energy (100 GeV) and high luminosity (1033/cm2/s) is emphasized.


2017 ◽  
Vol 685 ◽  
pp. 504-510
Author(s):  
Alexey Verkhovtsev ◽  
Lilian Ellis-Gibbings ◽  
Francisco Blanco ◽  
Gustavo García

Author(s):  
J. Taft∅

It is well known that for reflections corresponding to large interplanar spacings (i.e., sin θ/λ small), the electron scattering amplitude, f, is sensitive to the ionicity and to the charge distribution around the atoms. We have used this in order to obtain information about the charge distribution in FeTi, which is a candidate for storage of hydrogen. Our goal is to study the changes in electron distribution in the presence of hydrogen, and also the ionicity of hydrogen in metals, but so far our study has been limited to pure FeTi. FeTi has the CsCl structure and thus Fe and Ti scatter with a phase difference of π into the 100-ref lections. Because Fe (Z = 26) is higher in the periodic system than Ti (Z = 22), an immediate “guess” would be that Fe has a larger scattering amplitude than Ti. However, relativistic Hartree-Fock calculations show that the opposite is the case for the 100-reflection. An explanation for this may be sought in the stronger localization of the d-electrons of the first row transition elements when moving to the right in the periodic table. The tabulated difference between fTi (100) and ffe (100) is small, however, and based on the values of the scattering amplitude for isolated atoms, the kinematical intensity of the 100-reflection is only 5.10-4 of the intensity of the 200-reflection.


Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


Author(s):  
Douglas L. Dorset ◽  
Barbara Moss

A number of computing systems devoted to the averaging of electron images of two-dimensional macromolecular crystalline arrays have facilitated the visualization of negatively-stained biological structures. Either by simulation of optical filtering techniques or, in more refined treatments, by cross-correlation averaging, an idealized representation of the repeating asymmetric structure unit is constructed, eliminating image distortions due to radiation damage, stain irregularities and, in the latter approach, imperfections and distortions in the unit cell repeat. In these analyses it is generally assumed that the electron scattering from the thin negativelystained object is well-approximated by a phase object model. Even when absorption effects are considered (i.e. “amplitude contrast“), the expansion of the transmission function, q(x,y)=exp (iσɸ (x,y)), does not exceed the first (kinematical) term. Furthermore, in reconstruction of electron images, kinematical phases are applied to diffraction amplitudes and obey the constraints of the plane group symmetry.


Author(s):  
T. J. Beveridge

The Bacillus subtilis cell wall provides a protective sacculus about the vital constituents of the bacterium and consists of a collection of anionic hetero- and homopolymers which are mainly polysaccharidic. We recently demonstrated that unfixed walls were able to trap and retain substantial amounts of metal when suspended in aqueous metal salt solutions. These walls were briefly mixed with low concentration metal solutions (5mM for 10 min at 22°C), were well washed with deionized distilled water, and the quantity of metal uptake (atomic absorption and X-ray fluorescence), the type of staining response (electron scattering profile of thin-sections), and the crystallinity of the deposition product (X-ray diffraction of embedded specimens) determined.Since most biological material possesses little electron scattering ability electron microscopists have been forced to depend on heavy metal impregnation of the specimen before obtaining thin-section data. Our experience with these walls suggested that they may provide a suitable model system with which to study the sites of reaction for this metal deposition.


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