Characterization of leakage current in thin gate oxide subjected to 10 keV X-ray irradiation

IEEE Transactions on Electron Devices ◽

10.1109/16.824744 ◽

2000 ◽

Vol 47 (3) ◽

pp. 650-652 ◽

Author(s):

C.H. Ling ◽

C.H. Ang ◽

D.S. Ang

Keyword(s):

Leakage Current ◽

X Ray ◽

Thin Gate Oxide

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Radiation-induced leakage current of ultra-thin gate oxide under X-ray lithography conditions

Proceedings of the 1999 7th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.99TH8394) ◽

10.1109/ipfa.1999.791294 ◽

1999 ◽

Author(s):

Byung Jin Cho ◽

Sun Jung Kim ◽

C.H. Ling ◽

Moon Sig Joo ◽

In Seok Yeo

Keyword(s):

Leakage Current ◽

X Ray ◽

Radiation Induced ◽

Thin Gate Oxide

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Characterization of Global Inversion Layer in Thin-Gate-Oxide Deep-Submicron p-MOSFETs

Solid-State Electronics ◽

10.1016/s0038-1101(97)00204-9 ◽

1998 ◽

Vol 42 (3) ◽

pp. 401-404

Author(s):

Bin Yu ◽

Kiyotaga Imai ◽

Chenming Hu

Keyword(s):

Inversion Layer ◽

Deep Submicron ◽

Thin Gate Oxide

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The conduction mechanism of stress induced leakage current through ultra-thin gate oxide under constant voltage stresses

Chinese Physics ◽

10.1088/1009-1963/14/9/036 ◽

2005 ◽

Vol 14 (9) ◽

pp. 1886-1891 ◽

Author(s):

Wang Yan-Gang ◽

Xu Ming-Zhen ◽

Tan Chang-Hua ◽

Zhang J F. ◽

Duan Xiao-Rong

Keyword(s):

Leakage Current ◽

Conduction Mechanism ◽

Constant Voltage ◽

Stress Induced Leakage Current ◽

Thin Gate Oxide

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Fabrication and characterization of sub-micron thin gate oxide p-channel transistors with p+ polysilicon gates

10.1109/iedm.1985.190933 ◽

1985 ◽

Author(s):

D.W. Wenocur ◽

K.M. Cham ◽

J. Lin ◽

C.K. Lau ◽

H.S. Fu

Keyword(s):

Fabrication And Characterization ◽

Thin Gate Oxide

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On-chip charge pumping method for characterization of interface states of ultra thin gate oxide in nano cmos technology

IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest. ◽

10.1109/iedm.2005.1609449 ◽

2006 ◽

Author(s):

Hee-Hwan Ji ◽

Yong-Goo Kim ◽

In-Shik Han ◽

Kyung-Min Kim ◽

Jin-Suk Wang ◽

...

Keyword(s):

Cmos Technology ◽

Interface States ◽

Charge Pumping ◽

On Chip ◽

Thin Gate Oxide

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Reduced hot-carrier reliability degradation of x-ray irradiated MOSFETs in a 0.25 μm CMOS technology with ultra-thin gate oxide

Solid-State Electronics ◽

10.1016/0038-1101(93)90177-r ◽

1993 ◽

Vol 36 (9) ◽

pp. 1353-1355 ◽

Author(s):

A. Acovic ◽

C.C.-H. Hsu ◽

L.C. Hsia ◽

J.M. Aitken

Keyword(s):

Cmos Technology ◽

X Ray ◽

Hot Carrier ◽

Thin Gate Oxide

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Stress-induced high-field gate leakage current in ultra-thin gate oxide

Solid-State Electronics ◽

10.1016/s0038-1101(00)00008-3 ◽

2000 ◽

Vol 44 (6) ◽

pp. 977-980 ◽

Author(s):

Jianlin Wei ◽

Lingfeng Mao ◽

Mingzhen Xu ◽

Changhua Tan ◽

Xiaorong Duan

Keyword(s):

Leakage Current ◽

Gate Leakage Current ◽

Gate Leakage ◽

Thin Gate Oxide

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Improvement of direct-tunneling gate leakage current in ultra-thin gate oxide CMOS with TiN gate electrode using non-doped selective epitaxial Si channel technique

International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) ◽

10.1109/iedm.1999.824275 ◽

2003 ◽

Author(s):

H.S. Momose ◽

T. Ohguro ◽

E. Morifuji ◽

H. Sugaya ◽

S. Nakamura ◽

...

Keyword(s):

Leakage Current ◽

Gate Leakage Current ◽

Gate Leakage ◽

Gate Electrode ◽

Direct Tunneling ◽

Thin Gate Oxide

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Twin-GD: A New Twin Gated-Diode Measurement for the Interface Characterization of Ultra-Thin Gate Oxide MOSFET's with EOT Down to 1nm

13th International Symposium on the Physical and Failure Analysis of Integrated Circuits ◽

10.1109/ipfa.2006.250992 ◽

2006 ◽

Author(s):

G. Lee ◽

S. Chung ◽

A. Mao ◽

W. Lin ◽

C. Yang ◽

...

Keyword(s):

Interface Characterization ◽

Thin Gate Oxide

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Research on the Gate Leakage Current of PMOSFET with Ultra-thin Gate Oxide

Journal of Convergence Information Technology ◽

10.4156/jcit.vol7.issue11.6 ◽

2012 ◽

Vol 7 (11) ◽

pp. 44-51

Author(s):

Shigang HU ◽

Xiaofeng WU ◽

Zaifang XI

Keyword(s):

Leakage Current ◽

Gate Leakage Current ◽

Gate Leakage ◽

Thin Gate Oxide

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