Deterministic Integration of Quantum Dots into On-Chip Multi-Mode Interference Couplers Via in-Situ Electron Beam Lithography

2019 ◽  
Author(s):  
P. Schnauber ◽  
S. Rodt ◽  
S. Reitzenstein ◽  
J. Schall ◽  
S. Bounouar ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
On Chip ◽  
Multi Mode ◽  
Mode Interference

scholarly journals Deterministic Integration of Quantum Dots into on-Chip Multimode Interference Beamsplitters Using in Situ Electron Beam Lithography

Nano Letters ◽  
2018 ◽  
Vol 18 (4) ◽  
pp. 2336-2342 ◽  
Author(s):  
Peter Schnauber ◽  
Johannes Schall ◽  
Samir Bounouar ◽  
Theresa Höhne ◽  
Suk-In Park ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Multimode Interference ◽  
On Chip

On-chip tunable multi-mode interference reflector

2018 ◽  
Vol 51 (49) ◽  
pp. 495101
Author(s):  
Fengxin Dong ◽  
Anjin Liu ◽  
Pijie Ma ◽  
Wanhua Zheng
Keyword(s):  
On Chip ◽  
Multi Mode ◽  
Mode Interference

scholarly journals Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography

Nanoscale ◽  
2020 ◽  
Vol 12 (20) ◽  
pp. 11306-11316
Author(s):  
Christian D. Dieleman ◽  
Weiyi Ding ◽  
Lianjia Wu ◽  
Neha Thakur ◽  
Ivan Bespalov ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Luminescent Properties ◽  
Colloidal Quantum Dots ◽  
Direct Patterning ◽  
One Step ◽  
Patterning Technique

A general, one-step patterning technique for colloidal quantum dots by direct optical or e-beam lithography. Photons (5.5–91.9 eV) and electrons (3 eV–50 kV) crosslink and immobilize QDs down to tens of nm while preserving the luminescent properties.

scholarly journals Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice

Nano Letters ◽  
2018 ◽  
Vol 18 (8) ◽  
pp. 5036-5041 ◽  
Author(s):  
Yu Hong ◽  
Ding Zhao ◽  
Dongli Liu ◽  
Binze Ma ◽  
Guangnan Yao ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Water Ice

scholarly journals Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

2015 ◽  
Vol 86 (7) ◽  
pp. 073903 ◽  
Author(s):  
Arsenty Kaganskiy ◽  
Manuel Gschrey ◽  
Alexander Schlehahn ◽  
Ronny Schmidt ◽  
Jan-Hindrik Schulze ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Device Processing ◽  
Nanophotonic Device

In situ patterning of organic molecules in aqueous solutions using an inverted electron-beam lithography system

2016 ◽  
Vol 55 (6S1) ◽  
pp. 06GL07 ◽  
Author(s):  
Hiroki Miyazako ◽  
Kazuhiko Ishihara ◽  
Kunihiko Mabuchi ◽  
Takayuki Hoshino
Keyword(s):  
Electron Beam ◽  
Aqueous Solutions ◽  
Electron Beam Lithography ◽  
Organic Molecules ◽  
Lithography System

Fabrication and Luminescence of Etched Quantum Rings and Vertically Coupled Dots

1995 ◽  
Vol 406 ◽  
Author(s):  
G. E. Philippa ◽  
J. A. Mejia Galeana ◽  
C. Cassou ◽  
P. D. Wang ◽  
C. Guasch ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Electron Beam ◽  
Electric Field ◽  
Emission Spectrum ◽  
Electron Beam Lithography ◽  
Electrical Contacts ◽  
Outer Diameter ◽  
Quantum Rings ◽  
Order Of Magnitude ◽  
Linewidth Broadening

AbstractThe fabrication of GaAs-GaAIAs coupled quantum dots and of quantum rings using electron beam lithography and dry etching is described. Coupled dots of physical diameter of 500 and 250 nm were fabricated and processed with top electrical contacts to apply an electric field. We show that the emission spectrum of coupled dots is modified by the electric field. Quantum rings of 400 nm outer diameter and wall thickness of 25 nm were fabricated. The emission spectrum from rings showed the quantum well emission shifted to higher energies and although its intensity decreased by about one order of magnitude there was little linewidth broadening.

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