scholarly journals Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography

Nanoscale ◽  
2020 ◽  
Vol 12 (20) ◽  
pp. 11306-11316
Author(s):  
Christian D. Dieleman ◽  
Weiyi Ding ◽  
Lianjia Wu ◽  
Neha Thakur ◽  
Ivan Bespalov ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Luminescent Properties ◽  
Colloidal Quantum Dots ◽  
Direct Patterning ◽  
One Step ◽  
Patterning Technique

A general, one-step patterning technique for colloidal quantum dots by direct optical or e-beam lithography. Photons (5.5–91.9 eV) and electrons (3 eV–50 kV) crosslink and immobilize QDs down to tens of nm while preserving the luminescent properties.

One-step fabrication of photoluminescent SiC quantum dots through a radiation technique

2020 ◽  
Vol 44 (31) ◽  
pp. 13301-13307
Author(s):  
Wei Qi ◽  
Mengjie Li ◽  
Long Zhao
Keyword(s):  
Quantum Dots ◽  
Ionic Liquid ◽  
Electron Beam ◽  
Beam Radiation ◽  
Electron Beam Radiation ◽  
Radiation Technique ◽  
One Step

The fabrication of PL SiC-QDs by using ionic liquid-based microemulsions combined with electron beam radiation.

Fabrication and Luminescence of Etched Quantum Rings and Vertically Coupled Dots

1995 ◽  
Vol 406 ◽  
Author(s):  
G. E. Philippa ◽  
J. A. Mejia Galeana ◽  
C. Cassou ◽  
P. D. Wang ◽  
C. Guasch ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Electron Beam ◽  
Electric Field ◽  
Emission Spectrum ◽  
Electron Beam Lithography ◽  
Electrical Contacts ◽  
Outer Diameter ◽  
Quantum Rings ◽  
Order Of Magnitude ◽  
Linewidth Broadening

AbstractThe fabrication of GaAs-GaAIAs coupled quantum dots and of quantum rings using electron beam lithography and dry etching is described. Coupled dots of physical diameter of 500 and 250 nm were fabricated and processed with top electrical contacts to apply an electric field. We show that the emission spectrum of coupled dots is modified by the electric field. Quantum rings of 400 nm outer diameter and wall thickness of 25 nm were fabricated. The emission spectrum from rings showed the quantum well emission shifted to higher energies and although its intensity decreased by about one order of magnitude there was little linewidth broadening.

High-Resolution In Situ Patterning of Perovskite Quantum Dots via Femtosecond Laser Direct Writing

Nanoscale ◽  
2021 ◽  
Author(s):  
Shuyu Liang ◽  
Yue-Feng Liu ◽  
Shenyuan Wang ◽  
Hong Xia ◽  
Hong-Bo Sun
Keyword(s):  
Quantum Dots ◽  
High Resolution ◽  
Femtosecond Laser ◽  
Information Storage ◽  
Colloidal Quantum Dots ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Perovskite Quantum Dots ◽  
Patterning Technique

Colloidal quantum dots (QDs) have exhibited great potentials for optoelectronic applications, including display, laser, anti-counterfeiting and information storage. However, high-resolution patterning technique of QDs is still a challenge, while precise...

Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications

Nanoscale ◽  
2017 ◽  
Vol 9 (43) ◽  
pp. 16755-16763 ◽  
Author(s):  
Kaixi Bi ◽  
Quan Xiang ◽  
Yiqin Chen ◽  
Huimin Shi ◽  
Zhiqin Li ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Metal Deposition ◽  
Lithography Process ◽  
Direct Patterning ◽  
Copper Naphthenate ◽  
Device Applications ◽  
Lift Off ◽  
Copper Composite

We report an electron-beam lithography process to directly fabricate graphene@copper composite patterns without involving metal deposition, lift-off and etching processes.

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