Resistive Switching Effect in Thermal SiO2 Films Treated in Electron-Cyclotron Resonance Hydrogen Plasma

2021 ◽  
Author(s):  
Ramin Iskhakzay ◽  
Vitalii Voronkovskii ◽  
Vladimir Aliev ◽  
Vladimir Gritsenko
Keyword(s):  
Resistive Switching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Hydrogen Plasma ◽  
Electron Cyclotron ◽  
Switching Effect ◽  
Sio2 Films ◽  
Resistive Switching Effect

Experimental study of the hot and warm electron populations in an electron cyclotron resonance argon–oxygen–hydrogen plasma

1995 ◽  
Vol 2 (6) ◽  
pp. 2138-2140 ◽  
Author(s):  
R. Friedlein ◽  
S. Herpich ◽  
H. Hiller ◽  
H. Wirth ◽  
G. Zschornack ◽  
...  
Keyword(s):  
Experimental Study ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Hydrogen Plasma ◽  
Electron Cyclotron

GaAs‐oxide removal using an electron cyclotron resonance hydrogen plasma

1991 ◽  
Vol 58 (11) ◽  
pp. 1143-1145 ◽  
Author(s):  
Z. Lu ◽  
M. T. Schmidt ◽  
D. Chen ◽  
R. M. Osgood ◽  
W. M. Holber ◽  
...  
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Hydrogen Plasma ◽  
Electron Cyclotron ◽  
Oxide Removal

Evaluation of Hydrogenation on Semiconductor Surfaces Treated with Hydrogen-Plasma Beam Excited by Electron Cyclotron Resonance

1991 ◽  
Vol 30 (Part 1, No. 11B) ◽  
pp. 3203-3208
Author(s):  
Tomoaki Koui ◽  
Ikuo Suemune ◽  
Akihiro Kishimoto ◽  
Kazuhiko Hamaoka ◽  
Masamichi YAmanishi
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Hydrogen Plasma ◽  
Electron Cyclotron ◽  
Semiconductor Surfaces ◽  
Plasma Beam

scholarly journals Erratum: ‘‘GaAs‐oxide removal using an electron cyclotron resonance hydrogen plasma’’ [Appl. Phys. Lett. 58, 1143 (1991)]

1992 ◽  
Vol 61 (5) ◽  
pp. 616-616
Author(s):  
Z. Lu ◽  
M. T. Schmidt ◽  
D. Chen ◽  
R. M. Osgood ◽  
W. M. Holber ◽  
...  
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Hydrogen Plasma ◽  
Electron Cyclotron ◽  
Oxide Removal
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