Simulation and optimization of lightly-doped ultra-thin Triple Metal Double Gate (TM-DG) MOSFET with high-K dielectric for diminished short channel effects

Author(s):  
Santosh Kumar Gupta ◽  
Achinta Baidya ◽  
S. Baishya
2021 ◽  
Author(s):  
Prashant Kumar ◽  
Munish Vashishath ◽  
Neeraj Gupta ◽  
Rashmi Gupta

Abstract This paper describes the impression of low-k/high-k dielectric on the performance of Double Gate Junction less (DG-JL) MOSFET. An analytical model of the threshold voltage of DG-JLFET has been presented. Poisson’s equation is solved using the parabolic approximation to find out the threshold voltage. The effect of high-k on various performance parameters of N-type DG-JLFET is explored. The comparative analysis has been carried out between conventional gate oxide, multi oxide and high-k oxide in terms of Drain Induced Barrier Lowering (DIBL), threshold voltage, figure of merit (ION/IOFF) and sub-threshold slope (SS). The high-k oxide has shown superlative performance as compared to others. The results are further analyzed for various device structures. The DG-JLFET with HfO2 exhibits excellent attainment by mitigating the Short Channel Effects (SCEs). The significant reduction in off current makes the device suitable for ultra-low power applications. There is a 61.9 % and 34.29% improvement in the figure of merit and sub-threshold slope in the proposed device as compared to other devices. The simulation of DG-JLFET is carried out using the Silvaco TCAD tool.


2021 ◽  
Vol 13 (5) ◽  
pp. 05013-1-05013-6
Author(s):  
Zohmingmawia Renthlei ◽  
◽  
Swagat Nanda ◽  
Rudra Sankar Dhar ◽  
◽  
...  

2007 ◽  
Vol 54 (8) ◽  
pp. 1943-1952 ◽  
Author(s):  
A. Tsormpatzoglou ◽  
C.A. Dimitriadis ◽  
R. Clerc ◽  
Q. Rafhay ◽  
G. Pananakakis ◽  
...  

2012 ◽  
Vol 67 (6-7) ◽  
pp. 317-326 ◽  
Author(s):  
Alireza Heidari ◽  
Niloofar Heidari ◽  
Foad Khademi Jahromi ◽  
Roozbeh Amiri ◽  
Mohammadali Ghorbani

In this paper, first, the impact of different gate arrangements on the short-channel effects of carbon nanotube field-effect transistors with doped source and drain with the self-consistent solution of the three-dimensional Poisson equation and the Schr¨odinger equation with open boundary conditions, within the non-equilibrium Green function, is investigated. The results indicate that the double-gate structure possesses a quasi-ideal subthreshold oscillation and an acceptable decrease in the drain induced barrier even for a relatively thick gate oxide (5 nm). Afterward, the electrical characteristics of the double-gate carbon nanotube field-effect transistors (DG-CNTFET) are investigated. The results demonstrate that an increase in diameter and density of the nanotubes in the DG-CNTFET increases the on-state current. Also, as the drain voltage increases, the off-state current of the DG-CNTFET decreases. In addition, regarding the negative gate voltages, for a high drain voltage, increasing in the drain current due to band-to-band tunnelling requires a larger negative gate voltage, and for a low drain voltage, resonant states appear


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