A dynamic thermal management circuit for system-on-chip designs

Author(s):  
H. Chiueh ◽  
J. Draper ◽  
J. Choma
Author(s):  
K. Srivathsa Sudheendra ◽  
B. Suresh Vikram ◽  
Pavan Panchapakeshan ◽  
Sandip Kundu

2013 ◽  
Vol 380-384 ◽  
pp. 2986-2989
Author(s):  
Xin Li ◽  
Meng Tian Rong

On-chip thermal sensors are employed by dynamic thermal management techniques to measure runtime thermal behavior of microprocessors so as to prevent the on-set of high temperatures. The allocation and the placement of thermal sensors directly impact the effectiveness of the dynamic thermal management mechanisms. In this paper, we propose systematic and effective strategies for determining the optimal locations for temperature sensors based on thermal gradient analysis to provide the trade-off between hot spot estimation and full thermal reconstruction. Experimental results indicate the superiority of our techniques and confirm that our proposed methods are able to create a sensor distribution for a given microprocessor architecture.


Sensors ◽  
2020 ◽  
Vol 20 (13) ◽  
pp. 3725
Author(s):  
Hernán Aparicio ◽  
Pablo Ituero

The extreme miniaturization of electronic technologies has turned varying and unpredictable temperatures into a first-class concern for high performance processors which mitigate the problem employing dynamic thermal managements control systems. In order to monitor the thermal profile of the chip, these systems require a collection of on-chip temperature sensors with strict demands in terms of area and power overhead. This paper introduces a sensor topology specially tailored for these requirements. Targeting the 40 nm CMOS technology node, the proposed sensor uses both bipolar and CMOS transistors, benefiting from the stable thermal characteristics of the former and the compactness and speed of the latter. The sensor has been fully characterized through extensive post-layout simulations for a temperature range of 0 ∘ C to 100 ∘ C , achieving a maximum error of ±0.9 ∘ C / considering 3 σ yield and a resolution of 0.5 ∘ C . The area—900 μ m 2 , energy per conversion—1.06 nJ, and sampling period—2 μ s, are very competitive compared to previous works in the literature.


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