ScienceGate
Advanced Search
Author Search
Journal Finder
Blog
Sign in / Sign up
ScienceGate
Search
Author Search
Journal Finder
Blog
Sign in / Sign up
Effect of High-k Passivation Layer on Electrical Properties of GaN Metal-Insulator-Semiconductor Devices
2019 International Conference on IC Design and Technology (ICICDT)
◽
10.1109/icicdt.2019.8790844
◽
2019
◽
Cited By ~ 1
Author(s):
Yutao Cai
◽
Yang Wang
◽
Miao Cui
◽
Wen Liu
◽
Huiqing Wen
◽
...
Keyword(s):
Electrical Properties
◽
Semiconductor Devices
◽
Passivation Layer
◽
Metal Insulator
◽
Metal Insulator Semiconductor
◽
High K
Download Full-text
Related Documents
Cited By
References
Effect of High-k Passivation Layer on High Voltage Properties of GaN Metal-Insulator-Semiconductor Devices
IEEE Access
◽
10.1109/access.2020.2995906
◽
2020
◽
Vol 8
◽
pp. 95642-95649
Author(s):
Yutao Cai
◽
Yang Wang
◽
Ye Liang
◽
Yuanlei Zhang
◽
Wen Liu
◽
...
Keyword(s):
High Voltage
◽
Semiconductor Devices
◽
Passivation Layer
◽
Metal Insulator
◽
Metal Insulator Semiconductor
◽
High K
Download Full-text
Electrical Properties of Metal-Insulator-Semiconductor Devices with High Permittivity Gate Dielectric Layers
Supermaterials
◽
10.1007/978-94-010-0912-6_1
◽
2000
◽
pp. 1-20
◽
Cited By ~ 1
Author(s):
M. Houssa
◽
P. W. Mertens
◽
M. M. Heyns
◽
A. Stesmans
Keyword(s):
Electrical Properties
◽
Gate Dielectric
◽
Semiconductor Devices
◽
High Permittivity
◽
Metal Insulator
◽
Metal Insulator Semiconductor
◽
Dielectric Layers
Download Full-text
Peculiarities of electrical properties of metal-insulator-semiconductor capacitors based on high-k dielectric stack containing HfTiSiO:N and HfTiO:N films
2009 10th International Conference on Ultimate Integration of Silicon
◽
10.1109/ulis.2009.4897569
◽
2009
◽
Author(s):
V. Mikhelashvili
◽
P. Thangadurai
◽
W. D. Kaplan
◽
G. Eisenstein
Keyword(s):
Electrical Properties
◽
Metal Insulator
◽
Metal Insulator Semiconductor
◽
High K
◽
High K Dielectric
Download Full-text
Effect of surface treatment on electrical properties of GaN metal–insulator–semiconductor devices with Al2O3 gate dielectric
Japanese Journal of Applied Physics
◽
10.35848/1347-4065/ab7863
◽
2020
◽
Vol 59
(4)
◽
pp. 041001
Author(s):
Yutao Cai
◽
Wen Liu
◽
Miao Cui
◽
Ruize Sun
◽
Yung C. Liang
◽
...
Keyword(s):
Electrical Properties
◽
Surface Treatment
◽
Gate Dielectric
◽
Semiconductor Devices
◽
Metal Insulator
◽
Metal Insulator Semiconductor
◽
Al2o3 Gate Dielectric
◽
Effect Of Surface
Download Full-text
Physical and electrical properties of induced high-k ZrHfO crystallization with ZrN cap by high power impulse magnetron sputtering for metal–gate metal–insulator–semiconductor structures
Japanese Journal of Applied Physics
◽
10.7567/jjap.56.01ad02
◽
2016
◽
Vol 56
(1S)
◽
pp. 01AD02
◽
Cited By ~ 1
Author(s):
Jung-Ruey Tsai
◽
Pi-Chun Juan
◽
Cheng-Li Lin
◽
Guo-Cheng Lin
Keyword(s):
Electrical Properties
◽
Magnetron Sputtering
◽
High Power
◽
Metal Gate
◽
Metal Insulator
◽
Metal Insulator Semiconductor
◽
Semiconductor Structures
◽
High K
Download Full-text
Improved interfacial and electrical properties of vanadyl-phthalocyanine metal-insulator-semiconductor devices with silicon nitride as gate insulator
Applied Physics Letters
◽
10.1063/1.4845815
◽
2013
◽
Vol 103
(24)
◽
pp. 243302
◽
Cited By ~ 5
Author(s):
Lijuan Wang
◽
Yiping Li
◽
Xiaofeng Song
◽
Xin Liu
◽
Long Zhang
◽
...
Keyword(s):
Silicon Nitride
◽
Electrical Properties
◽
Semiconductor Devices
◽
Gate Insulator
◽
Metal Insulator
◽
Metal Insulator Semiconductor
Download Full-text
Electrical properties in vanadyl-phthalocyanine-based metal-insulator-semiconductor devices
Applied Physics Letters
◽
10.1063/1.2798585
◽
2007
◽
Vol 91
(15)
◽
pp. 153508
◽
Cited By ~ 13
Author(s):
Lijuan Wang
◽
Guojun Liu
◽
Haibo Wang
◽
De Song
◽
Bo Yu
◽
...
Keyword(s):
Electrical Properties
◽
Semiconductor Devices
◽
Metal Insulator
◽
Metal Insulator Semiconductor
Download Full-text
Novel high-k gate dielectric properties of ultrathin hydrocarbon films for next-generation metal-insulator-semiconductor devices
Carbon
◽
10.1016/j.carbon.2019.11.019
◽
2020
◽
Vol 158
◽
pp. 513-518
◽
Cited By ~ 1
Author(s):
Dong-Ok Kim
◽
Hyo-Ki Hong
◽
Dong-Bum Seo
◽
Tran Nam Trung
◽
Chan-Cuk Hwang
◽
...
Keyword(s):
Dielectric Properties
◽
Gate Dielectric
◽
Semiconductor Devices
◽
Next Generation
◽
Metal Insulator
◽
Metal Insulator Semiconductor
◽
Hydrocarbon Films
◽
High K
◽
High K Gate Dielectric
Download Full-text
Interface charge engineering in AlTiO/AlGaN/GaN metal–insulator–semiconductor devices
Journal of Applied Physics
◽
10.1063/1.5141399
◽
2020
◽
Vol 127
(9)
◽
pp. 094501
Author(s):
Duong Dai Nguyen
◽
Toshi-kazu Suzuki
Keyword(s):
Semiconductor Devices
◽
Metal Insulator
◽
Metal Insulator Semiconductor
◽
Interface Charge
Download Full-text
A Substitution for the High- k Dielectric in an AlGaN/GaN Metal-insulator-Semiconductor Heterostructure
Chinese Physics Letters
◽
10.1088/0256-307x/29/5/057702
◽
2012
◽
Vol 29
(5)
◽
pp. 057702
◽
Cited By ~ 1
Author(s):
Yue-Chan Kong
◽
Fang-Shi Xue
◽
Jian-Jun Zhou
◽
Liang Li
◽
Chen Chen
◽
...
Keyword(s):
Metal Insulator
◽
Metal Insulator Semiconductor
◽
Semiconductor Heterostructure
◽
High K
◽
High K Dielectric
Download Full-text
Sign in / Sign up
Close
Export Citation Format
Close
Share Document
Close