Fully-automated line-width measurement system and its applications

2002 ◽  
Author(s):  
M. Yoshizawa ◽  
K. Wada
Keyword(s):  
Line Width ◽  
Measurement System ◽  
Width Measurement ◽  
Automated Line

Sub-nanometer calibration of line width measurement and line edge detection by using STEM and sectional SEM

2012 ◽  
Author(s):  
Kiyoshi Takamasu ◽  
Haruki Okitou ◽  
Satoru Takahashi ◽  
Mitsuru Konno ◽  
Osamu Inoue ◽  
...  
Keyword(s):  
Edge Detection ◽  
Line Width ◽  
Width Measurement

scholarly journals Metrological atomic force microscope and traceable measurement of nano-dimension structures

ACTA IMEKO ◽  
2013 ◽  
Vol 2 (1) ◽  
pp. 12 ◽  
Author(s):  
Sitian Gao ◽  
Mingzhen Lu ◽  
Wei Li ◽  
Yushu Shi ◽  
Qi Li
Keyword(s):  
Atomic Force Microscope ◽  
Line Width ◽  
Semiconductor Industry ◽  
Step Height ◽  
Optical Instrument ◽  
Font Size ◽  
Height Measurement ◽  
Dimensional Measurement ◽  
Atomic Force ◽  
Width Measurement

<span style="font-family: &quot;Times New Roman&quot;; font-size: 10pt; mso-fareast-font-family: 宋体; mso-ansi-language: EN-GB; mso-fareast-language: ZH-CN; mso-bidi-language: AR-SA; mso-bidi-font-size: 12.0pt;" lang="EN-GB">The quantity assurance in semiconductor industry development requires dimensional measurement with nanometer accuracy. A metrological AFM is designed to establish a traceable standard with nanometer uncertainty. The principle and design of the instrument is introduced in this paper. The displacement of the sample is traced to the SI unit by interferometers. The metrological AFM is applied to step height and line width measurement. The results are compared with optical instrument and profilometer. The metrological AFM is used to step height measurement in an international comparison and the result shows an uncertainty less than </span><span style="font-family: &quot;Times New Roman&quot;; font-size: 10pt; mso-fareast-font-family: 宋体; mso-ansi-language: EN-CA; mso-fareast-language: ZH-CN; mso-bidi-language: AR-SA; mso-bidi-font-size: 12.0pt;" lang="EN-CA">2 nm. The application of metrological AFM in line width and pitch are also introduced.</span>

Line width measurement of a capillary discharge soft x-ray laser

2011 ◽  
Author(s):  
L. Urbanski ◽  
L. M. Meng ◽  
M. C. Marconi ◽  
M. Berril ◽  
O. Guilbaud ◽  
...  
Keyword(s):  
Line Width ◽  
Capillary Discharge ◽  
X Ray ◽  
Width Measurement

Line-Width Measurement Method of Narrow Line Width Lasers

2013 ◽  
Vol 50 (1) ◽  
pp. 010006 ◽  
Author(s):  
解东宏 Xie Donghong ◽  
邓大鹏 Deng Dapeng ◽  
郭丽 Guo Li ◽  
杨剑 Yang Jian ◽  
韦海军 Wei Haijun
Keyword(s):  
Line Width ◽  
Measurement Method ◽  
Narrow Line ◽  
Narrow Line Width ◽  
Width Measurement

Integrated circuit metrology with confocal optical microscopy

1986 ◽  
Vol 320 (1554) ◽  
pp. 307-313 ◽  
Keyword(s):  
Experimental Investigation ◽  
Edge Detection ◽  
Optical Microscopy ◽  
Line Width ◽  
Integrated Circuit ◽  
Focal Plane ◽  
Correct Interpretation ◽  
Smooth Variation ◽  
Width Measurement ◽  
Optical Micrographs

An experimental investigation of contrast in confocal optical micrographs of semiconductor wafers is presented. Results show a smooth variation of contrast over the edges of deposited layers as the focal plane is varied: correct interpretation of this contrast may enhance the accuracy of edge detection and hence of line-width measurement.

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