New method of quantitative modelling of fiber filters on thin films

2005 ◽  
Author(s):  
V.B. Katok ◽  
V.A. Manko ◽  
A.A. Manko
Keyword(s):  
Thin Films ◽  
New Method ◽  
Quantitative Modelling

New Method of Calculating Bulk and Surface States in Thin Films

1972 ◽  
Vol 28 (19) ◽  
pp. 1264-1268 ◽  
Author(s):  
Gerald P. Alldredge ◽  
Leonard Kleinman
Keyword(s):  
Thin Films ◽  
Surface States ◽  
New Method

New Method to Measure Tensile Strength of Low Modulus Thin Films

2011 ◽  
Vol 170 (2) ◽  
pp. 199-206 ◽  
Author(s):  
Nicholas J. Ginga ◽  
Suresh K. Sitaraman
Keyword(s):  
Thin Films ◽  
Tensile Strength ◽  
New Method ◽  
Low Modulus

New method for determining the nonlinear optical coefficients of thin films

1992 ◽  
Vol 61 (2) ◽  
pp. 145-146 ◽  
Author(s):  
Y. Hase ◽  
K. Kumata ◽  
S. S. Kano ◽  
M. Ohashi ◽  
T. Kondo ◽  
...  
Keyword(s):  
Thin Films ◽  
Nonlinear Optical ◽  
New Method

Vapor deposition of parylene-F using hydrogen as carrier gas

1999 ◽  
Vol 14 (1) ◽  
pp. 246-250 ◽  
Author(s):  
D. Mathur ◽  
G-R. Yang ◽  
T-M. Lu
Keyword(s):  
Thin Films ◽  
Vapor Deposition ◽  
Device Fabrication ◽  
New Method ◽  
Silicon Substrates ◽  
Microelectronic Device ◽  
Precursor Method ◽  
Liquid Precursor ◽  
Carrier Gas ◽  
Liquid Precursors

A new method for depositing parylene-F (PA-F) thin films on silicon substrates has been explored. Hydrogen has been used as a carrier gas along with liquid precursors, dibromotetrafluoro-p-xylene and 1,4-bis(trifluoromethyl)benzene, to deposit PA-F. The properties of this film have been compared with the films obtained by the Gorham dimer method and the liquid precursor method using FTIR, XPS, and XRD. The PA-F films deposited by the dimer or liquid precursor acquired some kind of microcrystallinity on annealing. However, the PA-F films deposited in the presence of hydrogen were amorphous on annealing. This property could be potentially exploited for application in microelectronic device fabrication.

A New Method of Making Extremely Thin Films

1935 ◽  
Vol 6 (12) ◽  
pp. 401-403 ◽  
Author(s):  
K. Lark‐Horovitz ◽  
J. D. Howe ◽  
E. M. Purcell
Keyword(s):  
Thin Films ◽  
New Method
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