20nm High-K metal gate heterogeneous 64-bit quad-core CPUs and hexa-core GPU for high-performance and energy-efficient mobile application processor

2015 International SoC Design Conference (ISOCC) ◽

10.1109/isocc.2015.7401760 ◽

2015 ◽

Author(s):

Hoi-Jin Lee ◽

Youngmin Shin ◽

Sung-il Bae ◽

Min-su Kim ◽

Kwangil Kim ◽

...

Keyword(s):

Energy Efficient ◽

Mobile Application ◽

High Performance ◽

High K ◽

Application Processor

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23.1 20nm high-K metal-gate heterogeneous 64b quad-core CPUs and hexa-core GPU for high-performance and energy-efficient mobile application processor

2015 IEEE International Solid-State Circuits Conference - (ISSCC) Digest of Technical Papers ◽

10.1109/isscc.2015.7063105 ◽

2015 ◽

Author(s):

Jungyul Pyo ◽

Youngmin Shin ◽

Hoi-Jin Lee ◽

Sung-il Bae ◽

Min-su Kim ◽

...

Keyword(s):

Energy Efficient ◽

Mobile Application ◽

High Performance ◽

High K ◽

Application Processor

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28nm high-K metal gate heterogeneous quad-core CPUs for high-performance and energy-efficient mobile application processor

2013 International SoC Design Conference (ISOCC) ◽

10.1109/isocc.2013.6864006 ◽

2013 ◽

Author(s):

Youngmin Shin ◽

Hoi-Jin Lee ◽

Ken Shin ◽

Prashant Kenkae ◽

Rajesh Kashyap ◽

...

Keyword(s):

Energy Efficient ◽

Mobile Application ◽

High Performance ◽

High K ◽

Application Processor

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28nm high- metal-gate heterogeneous quad-core CPUs for high-performance and energy-efficient mobile application processor

2013 IEEE International Solid-State Circuits Conference Digest of Technical Papers ◽

10.1109/isscc.2013.6487678 ◽

2013 ◽

Author(s):

Youngmin Shin ◽

Ken Shin ◽

P. Kenkare ◽

R. Kashyap ◽

Hoi-Jin Lee ◽

...

Keyword(s):

Energy Efficient ◽

Mobile Application ◽

High Performance ◽

Application Processor

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2.4 A 7nm High-Performance and Energy-Efficient Mobile Application Processor with Tri-Cluster CPUs and a Sparsity-Aware NPU

2020 IEEE International Solid- State Circuits Conference - (ISSCC) ◽

10.1109/isscc19947.2020.9062907 ◽

2020 ◽

Author(s):

Young Duk Kim ◽

Wookyeong Jeong ◽

Lakkyung Jung ◽

Dongsuk Shin ◽

Jae Geun Song ◽

...

Keyword(s):

Energy Efficient ◽

Mobile Application ◽

High Performance ◽

Application Processor

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3D heterogeneous integration of high performance high-K metal gate GaN NMOS and Si PMOS transistors on 300mm high-resistivity Si substrate for energy-efficient and compact power delivery, RF (5G and beyond) and SoC applications

2019 IEEE International Electron Devices Meeting (IEDM) ◽

10.1109/iedm19573.2019.8993583 ◽

2019 ◽

Author(s):

Han Wui Then ◽

C. Y. Huang ◽

B. Krist ◽

K. Jun ◽

K. Lin ◽

...

Keyword(s):

Energy Efficient ◽

High Performance ◽

Power Delivery ◽

High Resistivity ◽

Heterogeneous Integration ◽

Si Substrate ◽

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32nm gate-first high-k/metal-gate technology for high performance low power applications

2008 IEEE International Electron Devices Meeting ◽

10.1109/iedm.2008.4796770 ◽

2008 ◽

Author(s):

C. H. Diaz ◽

K. Goto ◽

H.T. Huang ◽

Yuri Yasuda ◽

C.P. Tsao ◽

...

Keyword(s):

Low Power ◽

High Performance ◽

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Tradeoff Between Hot Carrier and Negative Bias Temperature Degradations in High-Performance $\hbox{Si}_{1 - x}\hbox{Ge}_{x}$ pMOSFETs With High-$k$/Metal Gate Stacks

IEEE Electron Device Letters ◽

10.1109/led.2010.2071851 ◽

2010 ◽

Author(s):

Won-Ho Choi ◽

Chang-Young Kang ◽

Jung-Woo Oh ◽

Byoung-Hun Lee ◽

Prashant Majhi ◽

...

Keyword(s):

High Performance ◽

Negative Bias ◽

Gate Stacks ◽

Hot Carrier ◽

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High Performance Metal Gate CMOSFETs with Aggressively Scaled Hf-Based High-k

ECS Transactions ◽

10.1149/1.2209308 ◽

2019 ◽

Vol 1 (5) ◽

pp. 609-623 ◽

Author(s):

Seung-Chul Song ◽

G. L. Zhang ◽

S. H. Bae ◽

P. Kirsch ◽

P. Majhi ◽

...

Keyword(s):

High Performance ◽

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(Invited) Advanced Replacement High-K/Metal Gate Stack Engineering for High-Performance Strained Silicon-Germanium Finfets with High Ge Content

ECS Meeting Abstracts ◽

10.1149/ma2018-02/31/1018 ◽

2018 ◽

Keyword(s):

Silicon Germanium ◽

High Performance ◽

Strained Silicon ◽

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High performance FDSOI CMOS technology with metal gate and high-k

Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. ◽

10.1109/.2005.1469272 ◽

2005 ◽

Author(s):

B. Doris ◽

Y.H. Kim ◽

B.P. Linder ◽

M. Steen ◽

V. Narayanan ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

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