scholarly journals Impact of Surface Treatments and Post-Deposition Annealing Upon Interfacial Property of ALD-Al₂O₃ on a-Plane GaN

2020 ◽  
Vol 8 ◽  
pp. 970-975 ◽  
Author(s):  
Yanni Zhang ◽  
Jincheng Zhang ◽  
Zhuangzhuang Hu ◽  
Zhaoqing Feng ◽  
Hepeng Zhang ◽  
...  
Keyword(s):  
Surface Treatments ◽  
Interfacial Property ◽  
Post Deposition Annealing ◽  
Post Deposition

scholarly journals Control of Structural and Magnetic Properties of Polycrystalline Co2FeGe Films via Deposition and Annealing Temperatures

Nanomaterials ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 1229
Author(s):  
Andrii Vovk ◽  
Sergey A. Bunyaev ◽  
Pavel Štrichovanec ◽  
Nikolay R. Vovk ◽  
Bogdan Postolnyi ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Spin Transfer Torque ◽  
Spin Transfer ◽  
Post Deposition Annealing ◽  
Structure Variation ◽  
Annealing Temperatures ◽  
Damping Parameter ◽  
Soft Ferromagnetic ◽  
Thin Polycrystalline ◽  
Post Deposition

Thin polycrystalline Co2FeGe films with composition close to stoichiometry have been fabricated using magnetron co-sputtering technique. Effects of substrate temperature (TS) and post-deposition annealing (Ta) on structure, static and dynamic magnetic properties were systematically studied. It is shown that elevated TS (Ta) promote formation of ordered L21 crystal structure. Variation of TS (Ta) allow modification of magnetic properties in a broad range. Saturation magnetization ~920 emu/cm3 and low magnetization damping parameter α ~ 0.004 were achieved for TS = 573 K. This in combination with soft ferromagnetic properties (coercivity below 6 Oe) makes the films attractive candidates for spin-transfer torque and magnonic devices.

Control of crystal structure, morphology and optical properties of ceria films by post deposition annealing treatments

2016 ◽  
Vol 603 ◽  
pp. 363-370 ◽  
Author(s):  
Asmaa Eltayeb ◽  
Rajani K. Vijayaraghavan ◽  
Anthony P. McCoy ◽  
Joseph Cullen ◽  
Stephen Daniels ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Optical Properties ◽  
Post Deposition Annealing ◽  
Structure Morphology ◽  
Post Deposition

scholarly journals Post-Deposition Annealing Analysis for HfO[sub 2] Thin Films Using GIXRR∕GIXRD

2009 ◽  
Author(s):  
Wei-En Fu ◽  
Yong-Qing Chang ◽  
Yi-Ching Chen ◽  
Erik M. Secula ◽  
David G. Seiler ◽  
...  
Keyword(s):  
Thin Films ◽  
Post Deposition Annealing ◽  
Post Deposition

Colossal Magnetoresistance in Thick La0.7Ca0.3MnO3 Films

1995 ◽  
Vol 384 ◽  
Author(s):  
Randolph E. Treece ◽  
P. Dorsey ◽  
M. Rubinstein ◽  
J. M. Byers ◽  
J. S. Horwitz ◽  
...  
Keyword(s):  
Colossal Magnetoresistance ◽  
Single Phase ◽  
Laser Deposition ◽  
Orthorhombic Structure ◽  
X Ray Diffraction ◽  
Post Deposition Annealing ◽  
X Ray ◽  
Mr Effect ◽  
Deposited Films ◽  
Post Deposition

ABSTRACTThick films (0.6 and 2.0 μm) of the colossal magnetoresistance (CMR) material, La0.7Ca0.3MnO3 (LCMO), have been grown by pulsed laser deposition (PLD). The films were grown from single-phase LCMO targets in 100 mTorr 02 pressures and the material deposited on (100) LaAlO3 substrates at deposition temperatures of 800°C. The deposited films were characterized by X-ray diffraction (XRD), magnetic field-dependent resistivity, and Rutherford backscattering spectroscopy (RBS). The LCMO films were shown by XRD to adopt an orthorhombic structure. Brief post-deposition annealing led to ~50,000% and ~12,000% MR effect in the 0.6 μm and 2.0 μm films, respectively.

Crystallization of Molybdenum Disulfide Films Deposited by Pulsed Laser Ablation

1990 ◽  
Vol 201 ◽  
Author(s):  
J. S. Zabinski ◽  
M. S. Donley ◽  
P. J. John ◽  
V. J. Dyhouse ◽  
A. J. Safriet ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Raman Spectroscopy ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Emerging Technology ◽  
Substrate Material ◽  
Post Deposition Annealing ◽  
Film Properties ◽  
Deposition Parameters ◽  
Post Deposition

AbstractPulsed laser ablation (PLA) is an emerging technology that provides a mechanism to deposit lubricious films and to tailor film properties by the appropriate choice of substrate materials, deposition parameters and post deposition treatments. The properties of MoS2 films deposited by PLA are evaluated as a function of: (1) substrate material, (2) duration of post deposition annealing treatments using 248 nm laser radiation and (3) substrate temperature during deposition. The chemistry and crystal structure of the different films are determined using small angle X-ray diffraction (XRD), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering spectroscopy (RBS). The tribological properties of the films are then evaluated as a function of their chemistry and crystal structure.

Phase Control of RF Sputtered SnSx with Post-Deposition Annealing for a Pseudo-Homojunction Photovoltaic Device

2016 ◽  
Vol 46 (2) ◽  
pp. 1215-1222
Author(s):  
J. R. Nasr ◽  
J. J. Cordell ◽  
R. L. Gurunathan ◽  
J. R. S. Brownson ◽  
M. W. Horn
Keyword(s):  
Phase Control ◽  
Photovoltaic Device ◽  
Post Deposition Annealing ◽  
Post Deposition
Sign in / Sign up

Export Citation Format

Share Document