Measurement of the Anisotropy of Young's Modulus in Single-Crystal Silicon

2012 ◽  
Vol 21 (1) ◽  
pp. 243-249 ◽  
Author(s):  
Euan J. Boyd ◽  
Deepak Uttamchandani
1998 ◽  
Vol 518 ◽  
Author(s):  
H. Kahn ◽  
M.A. Huff ◽  
A.H. Heuer

AbstractSurface-micromachined polysilicon lateral resonant structures were fabricated and used to determine the temperature dependence of the Young's modulus of the polysilicon. This is done by passing a dc current through the beams during resonance testing, resulting in Joule-heating. The temperatures are calibrated by increasing the dc current until the melting point of silicon is attained. The calculated Young's moduli agree well with reported values for single crystal silicon.In addition, metal films were sputter-deposited onto the polysilicon resonators, and similar experiments performed on the composite devices to determine the temperature dependence of the modulus of the sputtered films. Ni films demonstrate a linear decrease in Young's modulus with temperature. TiNi films demonstrate two distinct modulus values with an intermediate transition region, due to the temperature-induced reversible phase transformation exhibited by TiNi.


Author(s):  
Aubrey Nathan Beal

Nonlinear MEMS beams have been modeled using SPICE. This allows for the complex dynamics of MEMS resonators to be observed parallel to their supporting electronics via circuit simulation. Silicon generally provides suitably linear parameters for use in MEMS. However, nonlinearities may arise due to issues such as amplitude-frequency (A-F) effect, large displacement of the proof mass, pull-in voltage, fatigue, material or electrical parameters, process variation, simplified beam modeling and nonlinear spring constants. By modeling these effects in SPICE, the design of electronics that automatically test, calibrate, report or even mitigate these effects is aided. Single-crystal silicon is a highly linear material up until its failure, especially type <100>. High quality factor MEMS devices may, however, be affected by even small nonlinear terms in the material's Young's modulus. Geometric deformations may also occur due to decreases in cross-sectional area of beams in reaction to stretching and loading. Specifically, by including nonlinear geometric effects of MEMS beams and nonlinear terms in the Young's modulus of <100> and <110> silicon - nonlinear and chaotic oscillations are shown to arise via SPICE simulation. Using this SPICE modeling method, electronic systems were designed to monitor the nonlinear parameters of MEMS beams that cause A-F effect and chaotic Duffing oscillations. Extracting parameters such as those from the oscillation's Poincare section may yield advantage in built-in self-test (BIST) applications. The features in these nonlinear oscillations extend parameters to monitor and potentially calibrate MEMS devices for reliability, stability and processing variation.


Author(s):  
N. Lewis ◽  
E. L. Hall ◽  
A. Mogro-Campero ◽  
R. P. Love

The formation of buried oxide structures in single crystal silicon by high-dose oxygen ion implantation has received considerable attention recently for applications in advanced electronic device fabrication. This process is performed in a vacuum, and under the proper implantation conditions results in a silicon-on-insulator (SOI) structure with a top single crystal silicon layer on an amorphous silicon dioxide layer. The top Si layer has the same orientation as the silicon substrate. The quality of the outermost portion of the Si top layer is important in device fabrication since it either can be used directly to build devices, or epitaxial Si may be grown on this layer. Therefore, careful characterization of the results of the ion implantation process is essential.


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