Passivation of Amorphous Oxide Semiconductors Utilizing a Zinc–Tin–Silicon–Oxide Barrier Layer
2012 ◽
Vol 33
(6)
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pp. 836-838
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2006 ◽
Vol 45
(5B)
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pp. 4303-4308
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Keyword(s):
2019 ◽
Vol 40
(2)
◽
pp. 607-623
2009 ◽
Vol 632
(1-2)
◽
pp. 139-142
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Keyword(s):
Keyword(s):
2006 ◽
Vol 352
(9-20)
◽
pp. 851-858
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Keyword(s):