A > 3 kV/2.94 m $\Omega\cdot$ cm2 and Low Leakage Current With Low Turn-On Voltage Lateral GaN Schottky Barrier Diode on Silicon Substrate With Anode Engineering Technique

2019 ◽  
Vol 40 (10) ◽  
pp. 1583-1586 ◽  
Author(s):  
Tao Zhang ◽  
Jinfeng Zhang ◽  
Shengrui Xu ◽  
Xiaoling Duan ◽  
Jing Ning ◽  
...  
Author(s):  
H. Kozaka ◽  
M. Takata ◽  
S. Murakami ◽  
T. Yatsuo

2012 ◽  
Vol 725 ◽  
pp. 53-56 ◽  
Author(s):  
Kenichi Ohtsuka ◽  
T. Nakatani ◽  
A. Nagae ◽  
H. Watanabe ◽  
Y. Nakaki ◽  
...  

SiC Schottky barrier diodes were fabricated and measured properties were characterized by device simulation. Most of devices show low leakage current, however, a few devices show leakage current larger than the values estimated from deviation of drift layer parameters. The leakage current component remarkable in lower voltage and saturating at higher voltage is related to Schottky barrier tunneling at macroscopic defects. The component remarkable in higher voltage is considered to be due to microscopic defect related generation current, concerning with non-stoichiometry.


Author(s):  
Jiyong Lim ◽  
Young-Hwan Choi ◽  
Sun-Jae Kim ◽  
Kyu-Heon Cho ◽  
Young-Shil Kim ◽  
...  

2015 ◽  
Vol 54 (7) ◽  
pp. 070302 ◽  
Author(s):  
Hyun-Gyu Jang ◽  
Jeho Na ◽  
Jung-Jin Kim ◽  
Young-Rak Park ◽  
Hyun-Soo Lee ◽  
...  

2021 ◽  
Vol 15 (1) ◽  
pp. 016501
Author(s):  
Fumio Otsuka ◽  
Hironobu Miyamoto ◽  
Akio Takatsuka ◽  
Shinji Kunori ◽  
Kohei Sasaki ◽  
...  

Abstract We fabricated high forward and low leakage current trench MOS-type Schottky barrier diodes (MOSSBDs) in combination with a field plate on a 12 μm thick epitaxial layer grown by halide vapor phase epitaxy on β-Ga2O3 (001) substrate. The MOSSBDs, measuring 1.7 × 1.7 mm2, exhibited a forward current of 2 A (70 A cm−2) at 2 V forward voltage and a leakage current of 5.7 × 10–10 A at −1.2 kV reverse voltage (on/off current ratio of > 109) with an ideality factor of 1.05 and wafer-level specific on-resistance of 17.1 mΩ · cm2.


ETRI Journal ◽  
2009 ◽  
Vol 31 (6) ◽  
pp. 725-731 ◽  
Author(s):  
Yong-Seo Koo ◽  
Kwangsoo Kim ◽  
Shihong Park ◽  
Kwidong Kim ◽  
Jong-Kee Kwon

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