High heat flux, single-phase microchannel cooling

Author(s):  
Rui Zhang ◽  
Marc Hodes ◽  
Nathan Lower ◽  
Ross Wilcoxon
2015 ◽  
Vol 137 (3) ◽  
Author(s):  
Abas Abdoli ◽  
George S. Dulikravich ◽  
Genesis Vasquez ◽  
Siavash Rastkar

Two-layer single phase flow microchannels were studied for cooling of electronic chips with a hot spot. A chip with 2.45 × 2.45 mm footprint and a hot spot of 0.5 × 0.5 mm in its center was studied in this research. Two different cases were simulated in which heat fluxes of 1500 W cm−2 and 2000 W cm−2 were applied at the hot spot. Heat flux of 1000 W cm−2 was applied on the rest of the chip. Each microchannel layer had 20 channels with an aspect ratio of 4:1. Direction of the second microchannel layer was rotated 90 deg with respect to the first layer. Fully three-dimensional (3D) conjugate heat transfer analysis was performed to study the heat removal capacity of the proposed two-layer microchannel cooling design for high heat flux chips. In the next step, a linear stress analysis was performed to investigate the effects of thermal stresses applied to the microchannel cooling design due to variations of temperature field. Results showed that two-layer microchannel configuration was capable of removing heat from high heat flux chips with a hot spot.


2015 ◽  
Vol 137 (7) ◽  
Author(s):  
Maritza Ruiz ◽  
Van P. Carey

This paper presents an experimental study of the heat transfer and pressure drop characteristics of a single phase high heat flux microchannel cooling system with spiraling radial inflow. The heat sink provides enhanced heat transfer with a simple inlet and outlet design while providing uniform flow distribution. The system is heated from one conducting wall made of copper and uses water as a working fluid. The microchannel has a 1 cm radius and a 300 μm gap height. Experimental results show, on average, a 76% larger pressure drop compared to an analytic model for laminar flow in a parallel disk system with spiral radial inflow. The mean heat transfer coefficients measured are up to four times the heat transfer coefficient for unidirectional laminar fully developed flow between parallel plates with the same gap height. Flow visualization studies indicate the presence of secondary flows and the onset of turbulence at higher flow rates. Combined with the thermally developing nature of the flow, these characteristics lead to enhanced heat transfer coefficients relative to the laminar parallel plate values. Another beneficial feature of this device, for high heat flux cooling applications, is that the thermal gradients on the surface are small. The average variation in surface temperature is 18% of the total bulk fluid temperature gain across the device. The system showed promising cooling characteristics for electronics and concentrated photovoltaics applications with a heat flux of 113 W/cm2 at a surface temperature of 77 °C and a ratio of pumping power to heat rate of 0.03%.


Author(s):  
Juergen J. Brandner ◽  
Natrah binti Kamaruzaman ◽  
Stefan Maikowske

A microstructure device for cooling of hot surfaces at liquid single phase laminar flow is presented. The initial design as well as the theoretical background is described in detail. It consists of numerous short micro channels acting as overflow structures and providing a relatively large hydraulic diameter, used in parallel between large inlet and outlet channels. The design was chosen to be scalable as well as appropriate for mass production in different materials. The fluid distribution was optimized as well as the dimensions of the overflow structures in terms of heat transfer, both by CFD simulations. Several devices were tested. They provide very high heat flux at reasonably low pressure drop. The temperature difference to achieve, heat flux and pressure drop can be adjusted easily by control of the applied mass flow. The design was tested as liquid-liquid heat exchanger in a simple lab-scale test facility. Moreover, using a copper electrically powered surface heat focus, some devices were tested as surface coolers.


2013 ◽  
Vol 388 ◽  
pp. 18-22 ◽  
Author(s):  
Ridho Irwansyah ◽  
Nandy Putra

The development of electronic components such as microprocessor requires a better thermal management system to overcome the high heat flux produce by the component. The method to absorb the heat produce by the microprocessor is still use the conduction or either natural or free convection which still in a single phase heat transfer. One of heat transfer method that suitable for a high heat flux application is pool boiling which has a two order of magnitude higher than of a single phase heat transfer and does not require a pump to move the fluid. In this study has been conducted the pool boiling experiment with four different porous media surface which are sintered copper 300 µm and 400 µm, copper screen mesh and stainless steel screen mesh with four different fluid which are Al2O3-Water 1%, 3% and 5%. The sintered copper 400 µm has shown a better heat transfer performance compared to the other porous media. The Water, Al2O3-Water 5% has shown a performance no better than Al2O3-Water 1% and 3%.


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