A Novel Characterization Scheme of $\hbox{Si/SiO}_{2}$ Interface Roughness for Surface Roughness Scattering-Limited Mobilities of Electrons and Holes in Unstrained- and Strained-Si MOSFETs
2010 ◽
Vol 57
(9)
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pp. 2057-2066
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2009 ◽
Vol 30
(9)
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pp. 987-989
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2012 ◽
Vol 717-720
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pp. 1101-1104
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Keyword(s):
2002 ◽
Vol 124
(2)
◽
pp. 127-134
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2003 ◽
Vol 2
(2)
◽
pp. 110-114
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Keyword(s):